Light-Emitting Module, Light-Emitting Device, Method of Manufacturing the Light-Emitting Module, and Method of Manufacturing the Light-Emitting Device

ABSTRACT

A highly reliable light-emitting module including an organic EL element or a light-emitting device using a highly reliable light-emitting module including an organic EL element is provided. Alternatively, a method of manufacturing a highly reliable light-emitting module including an organic EL element, or a method of manufacturing a light-emitting device using a highly reliable light-emitting module including an organic EL element is provided. The light-emitting module has a structure in which a light-emitting element formed over a first substrate and a viscous material layer are sealed in a space between the first substrate and a second substrate which face each other, with a sealing material surrounding the light-emitting element. The viscous material layer is provided between the light-emitting element and the second substrate and includes a non-solid material and a drying agent which reacts with or adsorbs an impurity.

This application is a continuation of copending U.S. application Ser.No. 13/592,722, filed on Aug. 23, 2012 which is incorporated herein byreference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a light-emitting module, alight-emitting device using the light-emitting module, a method ofmanufacturing the light-emitting module, and a method of manufacturingthe light-emitting device using the light-emitting module.

2. Description of the Related Art

A light-emitting element, in which a layer including an organic compoundhaving a light-emitting property (also referred to as EL layer) which isformed in a film shape is provided between a pair of electrodes, isknown. Such a light-emitting element is called, for example, an organicEL element. Light emission can be obtained from the layer including anorganic compound having a light-emitting property when a voltage isapplied between the pair of electrodes. Lighting devices andlight-emitting devices used for display devices and the like each usingorganic EL elements are known. An example of a display device using anorganic EL element is disclosed in Patent Document 1.

The reliability of an organic EL element tends to decrease in theenvironment where there are impurities in the air (such as water and/oroxygen). A variety of structures for sealing an organic EL element havebeen considered.

For example, a sealing structure in which an organic EL element formedover a substrate with low moisture permeability is covered with asealing film with low moisture permeability is known. Further, PatentDocument 2 discloses an example of a display device in which a pair ofsubstrates is firmly bonded so that a layer containing a hygroscopicsubstance and an organic EL element can be sealed in a space between thepair of substrates.

REFERENCES

-   Patent Document 1: Japanese Published Patent Application No.    2002-324673-   Patent Document 2: Japanese Published Patent Application No.    2005-209633

SUMMARY OF THE INVENTION

A sealing film covering an organic EL element needs to be sufficientlythick using a material which does not easily allow entry of impuritiesfrom the air to have sufficiently low moisture permeability(specifically, to have such a gas barrier property that the water vaportransmittance is 10⁻⁵ g/m²·day or less, preferably 10⁻⁶ g/m²·day orless).

For example, a film containing an inorganic material which is formed tobe sufficiently thick by a CVD method, a sputtering method, or the likewithout causing a pinhole does not easily allow entry of impurities fromthe air and is suitable as the sealing film for an organic EL element.However, with a CVD method, a sputtering method, or the like, a sealingfilm having a sufficient thickness is difficult to form in a short timedue to low film deposition speed.

In contrast, with a method in which a liquid composition is hardened, athick film can be formed in a short time. However, hardening a liquidcomposition in contact with an organic EL element involves a volumeshrinkage, which applies a stress to the organic EL element.Consequently the organic EL element may be damaged to cause a defect inlight emission.

One embodiment of the present invention is made in view of the foregoingtechnical background. It is an object of one embodiment of the presentinvention to provide a highly reliable light-emitting module includingan organic EL element.

In addition, it is an object to provide a light-emitting device using ahighly reliable light-emitting module including an organic EL element.

In addition, it is an object to provide a method of manufacturing ahighly reliable light-emitting module including an organic EL element.

In addition, it is an object to provide a method of manufacturing alight-emitting device using a highly reliable light-emitting moduleincluding an organic EL element.

In order to achieve the above objects, one embodiment of the presentinvention has focused on the stress applied to an organic EL element bythe sealing structure in which the organic EL element is covered.Further, one embodiment of the present invention has arrived at an ideaof a light-emitting module having a structure described below, whichsolves the above problems.

A light-emitting module of one embodiment of the present invention has astructure in which a light-emitting element formed over a firstsubstrate and a viscous material layer are sealed in a space between thefirst substrate and a second substrate which face each other, with asealing material surrounding the light-emitting element. The viscousmaterial layer is provided between the light-emitting element and thesecond substrate, and includes a non-solid material having viscosity anda drying agent that can react with or adsorb an impurity.

That is, one embodiment of the present invention is a light-emittingmodule including a first substrate, a second substrate facing the firstsubstrate, a sealing material bonding the first and second substrates,and a light-emitting element, a viscous material layer, and a framewhich are between the first substrate and the second substrate. In thelight-emitting module, the light-emitting element includes a firstelectrode provided over the first substrate, a second electrodeoverlapping with the first electrode, and a layer including an organiccompound having a light-emitting property between the first and secondelectrodes. In addition, the viscous material layer is in contact withthe light-emitting element and provided between the first and secondsubstrates, and includes a non-solid material having viscosity and adrying agent that can react with or adsorb an impurity. Further, theframe surrounds the light-emitting element and the viscous materiallayer. In addition, the sealing material is provided so that thelight-emitting element, the viscous material layer, and the frame can besealed inside.

The light-emitting module of one embodiment of the present invention hasa structure in which the light-emitting element formed over the firstsubstrate and the viscous material layer are sealed in a space betweenthe first and second substrates which face each other, with the sealingmaterial surrounding the light-emitting element. The viscous materiallayer is surrounded by the frame, in contact with the light-emittingelement and provided between the first and second substrates, andincludes a non-solid material having viscosity and a drying agent thatreacts with an impurity (typically water and/or oxygen) or adsorbs animpurity.

Since the light-emitting element is enclosed by the first substrate, thesecond substrate, the sealing material bonding the first and secondsubstrates, and the viscous material layer, entry of impurities into thelight-emitting module can be reduced. Further, since the viscousmaterial layer is non-solid, it flows between the light-emitting elementand the second substrate. Accordingly, a stress applied to thelight-emitting element is reduced by the viscous material layer, so thatdamage to the light-emitting element can be prevented. Furthermore, thedrying agent included in the viscous material layer reacts with oradsorbs an impurity remaining in the light-emitting module and/or animpurity entering the light-emitting module from the outside of themodule. Accordingly, deterioration of the light-emitting element can beprevented. Further, the viscous material layer provided in contact withthe light-emitting element can release heat generated by driving of thelight-emitting element, to the second substrate, so that deteriorationof the light-emitting element caused by the heat can be reduced.Furthermore, a stress generated between the light-emitting element andthe second substrate because of a change in the size of thelight-emitting element due to the heat generation can be reduced by theviscous material layer between the light-emitting element and the secondsubstrate, so that damage to the light-emitting element can beprevented.

Because of a combined effect of the above, a highly reliablelight-emitting module including an organic EL element can be provided.Further, a light-emitting module which is unlikely to cause a defect inlight emission can be provided.

One embodiment of the present invention is a light-emitting moduleincluding a first substrate, a second substrate facing the firstsubstrate, a sealing material bonding the first and second substrates,and a light-emitting element, a viscous material layer, and a framewhich are between the first substrate and the second substrate. In thelight-emitting module, the light-emitting element includes a firstelectrode provided over the first substrate, a second electrodeoverlapping with the first electrode, and a layer including an organiccompound having a light-emitting property between the first and secondelectrodes. In addition, the viscous material layer is in contact withthe light-emitting element and provided between the first and secondsubstrates, and includes a non-solid material having viscosity and adrying agent that can react with or adsorb an impurity. Further, theframe surrounds the light-emitting element, the viscous material layer,a first space, and a second space. The first space overlaps with thelight-emitting element, while the second space is connected to the firstspace through a narrow portion and includes at least a portion which isnot filled with the viscous material layer. In addition, the sealingmaterial is provided so that the light-emitting element, the viscousmaterial layer, and the frame can be sealed inside.

The light-emitting module of one embodiment of the present invention hasa structure in which the light-emitting element formed over the firstsubstrate and the viscous material layer are sealed in a space betweenthe first and second substrates which face each other, with the sealingmaterial surrounding the light-emitting element. The viscous materiallayer is surrounded by the frame, in contact with the light-emittingelement and provided between the first and second substrates, andincludes a non-solid material having viscosity and a drying agent thatreacts with an impurity (typically water and/or oxygen) or adsorbs animpurity. In addition, the frame surrounds the first space overlappingwith the light-emitting element and the second space connected to thefirst space through the narrow portion. At least the portion of thesecond space is not filled with the viscous material layer.

Since the light-emitting element is enclosed by the first substrate, thesecond substrate, the sealing material bonding the first and secondsubstrates, and the viscous material layer, entry of impurities into thelight-emitting module can be reduced. Further, since the viscousmaterial layer is non-solid, it flows between the light-emitting elementand the second substrate. Accordingly, a stress applied to thelight-emitting element is reduced by the viscous material layer, so thatdamage to the light-emitting element can be prevented. Furthermore, thedrying agent included in the viscous material layer reacts with oradsorbs an impurity remaining in the light-emitting module and/or animpurity entering the light-emitting module from the outside of themodule. Accordingly, deterioration of the light-emitting element can beprevented. Further, the viscous material layer provided in contact withthe light-emitting element can release heat generated by driving of thelight-emitting element, to the second substrate, so that deteriorationof the light-emitting element caused by the heat can be reduced.Furthermore, a stress generated between the light-emitting element andthe second substrate because of a change in the size of thelight-emitting element due to the heat generation can be reduced by theviscous material layer between the light-emitting element and the secondsubstrate, so that damage to the light-emitting element can beprevented. In addition, the portion in the second space which isconnected to the first space through the narrow portion and is notfilled with the viscous material layer can compensate for a change inthe volume of the viscous material layer due to heat generation in thelight-emitting module or can reduce a stress due to the volume change.Accordingly, it is possible to prevent the phenomenon in which theviscous material layer expands with heat to break the sealing structure(e.g., the bond structure of the sealing material) of the light-emittingmodule.

Because of a combined effect of the above, a highly reliablelight-emitting module including an organic EL element can be provided.Further, a light-emitting module which is unlikely to cause a defect inlight emission can be provided.

One embodiment of the present invention is a light-emitting module whichhas the above structure and in which the second electrode, the viscousmaterial layer, and the second substrate can transmit light emitted fromthe layer including an organic compound having a light-emittingproperty.

In the light-emitting module of one embodiment of the present invention,components from the second electrode of the light-emitting element tothe second substrate are each formed using a material having alight-transmitting property. Consequently, light emitted from thelight-emitting element can be extracted through the second substrate. Inaddition, the second electrode of the light-emitting element and thesecond substrate are optically connected to each other by the viscousmaterial layer, so that light emitted from the layer including anorganic compound having a light-emitting property can be efficientlyextracted through the second substrate. Accordingly, a light-emittingmodule having high emission efficiency can be provided. Further, ahighly reliable light-emitting module can be provided. Further, alight-emitting module which is unlikely to cause a defect in lightemission can be provided.

One embodiment of the present invention is a light-emitting module whichhas the above structure and in which the median particle size of thedrying agent included in the viscous material layer is greater than orequal to 10 nm and less than or equal to 400 nm.

The light-emitting module of one embodiment of the present inventionincludes the drying agent having a median particle size greater than orequal to 10 nm and less than or equal to 400 nm. This can inhibit thephenomenon in which light emitted by the organic compound having alight-emitting property is scattered in the viscous material layer.Accordingly, a light-emitting module having high emission efficiency canbe provided. Further, a highly reliable light-emitting module can beprovided. Further, a light-emitting module which is unlikely to cause adefect in light emission can be provided.

One embodiment of the present invention is a light-emitting module whichhas the above structure and further includes an activation materiallayer between the first substrate and the second substrate. Theactivation material layer overlaps with a region between thelight-emitting element and the frame and includes a material which canactivate the drying agent included in the viscous material layer.

The light-emitting module of one embodiment of the present inventionincludes the activation material layer between the light-emittingelement and the frame. The activation material layer includes theactivation material and has the effect of activating the drying agentincluded in the viscous material layer. In such a structure, the viscousmaterial layer having fluidity flows in a space to be surrounded by theframe surrounding the light-emitting element. The drying agent includedin the viscous material layer reacts with or adsorbs an impurity betweenthe second electrode of the light-emitting element and the secondsubstrate. Then, the drying agent which have reacted with or adsorbed animpurity comes in contact with the activation material layer providedbetween the light-emitting element and the frame, and is reactivated.Thus, a highly reliable light-emitting module including an organic ELelement can be provided. Further, a light-emitting module which isunlikely to cause a defect in light emission can be provided.

One embodiment of the present invention is a light-emitting deviceincluding a first substrate, a second substrate facing the firstsubstrate, a sealing material bonding the first and second substrates, atransistor, and a light-emitting element, a viscous material layer, anda frame which are between the first substrate and the second substrate.In the light-emitting device, the transistor is provided over the firstsubstrate. In addition, the light-emitting element includes a firstelectrode which is provided over the first substrate and supplied withelectric power through the transistor, a second electrode overlappingwith the first electrode, and a layer including an organic compoundhaving a light-emitting property between the first and secondelectrodes. In addition, the viscous material layer is in contact withthe light-emitting element and provided between the first and secondsubstrates, and includes a non-solid material having viscosity and adrying agent that can react with or adsorb an impurity. Further, theframe surrounds the transistor, the light-emitting element, and theviscous material layer. In addition, the sealing material is provided sothat the light-emitting element, the viscous material layer, and theframe can be sealed inside.

The light-emitting device of one embodiment of the present invention hasa structure in which the transistor formed over the first substrate, thelight-emitting element which is formed over the first substrate andconnected to the transistor, and the viscous material layer are sealedin a space between the first and second substrates which face eachother, with the sealing material surrounding the light-emitting element.The viscous material layer is surrounded by the frame, in contact withthe light-emitting element and provided between the first and secondsubstrates, and includes a non-solid material having viscosity and adrying agent that reacts with an impurity (typically water and/oroxygen) or adsorbs an impurity.

Since the light-emitting element is enclosed by the first substrate, thesecond substrate, the sealing material bonding the first and secondsubstrates, and the viscous material layer, entry of impurities into thelight-emitting device can be reduced. Further, since the viscousmaterial layer is non-solid, it flows between the light-emitting elementand the second substrate. Accordingly, a stress applied to thelight-emitting element is reduced by the viscous material layer, so thatdamage to the light-emitting element can be prevented. Furthermore, thedrying agent included in the viscous material layer reacts with oradsorbs an impurity remaining in the light-emitting device and/or animpurity entering the light-emitting device from the outside of thedevice. Accordingly, deterioration of the light-emitting element can beprevented. Further, the viscous material layer provided in contact withthe light-emitting element can release heat generated by driving of thelight-emitting element, to the second substrate, so that deteriorationof the light-emitting element caused by the heat can be reduced.Furthermore, a stress generated between the light-emitting element andthe second substrate because of a change in the size of thelight-emitting element due to the heat generation can be reduced by theviscous material layer between the light-emitting element and the secondsubstrate, so that damage to the light-emitting element can beprevented.

Accordingly, a highly reliable light-emitting device including anorganic EL element can be provided. Further, a light-emitting devicewhich is unlikely to cause a defect in light emission can be provided.

One embodiment of the present invention is a light-emitting device whichhas the above structure and in which the transistor includes a gateinsulating layer, a gate electrode in contact with one side of the gateinsulating layer, an oxide semiconductor layer that is in contact withthe other side of the gate insulating layer and overlaps with the gateelectrode, and a source electrode and a drain electrode that are eachelectrically connected to the oxide semiconductor layer and have a gapoverlapping with the gate electrode, and in which the first electrode ofthe light-emitting element is electrically connected to the sourceelectrode or the drain electrode.

The light-emitting device of one embodiment of the present inventionincludes the transistor including the oxide semiconductor layer in achannel formation region, in which the transistor and the viscousmaterial layer are sealed with the sealing material surrounding thelight-emitting element. In addition, the viscous material layer includesthe non-solid material having viscosity and the drying agent which canreact with or adsorb an impurity (typically water).

Since the transistor including the oxide semiconductor layer in achannel formation region and the light-emitting element are enclosed bythe first substrate, the second substrate, the sealing material bondingthe first and second substrates, and the viscous material layer, entryof impurities into the light-emitting device can be reduced.Furthermore, the drying agent included in the viscous material layerreacts with or adsorbs an impurity remaining in the light-emittingdevice and/or an impurity entering the light-emitting device from theoutside of the device. Accordingly, an impurity including a hydrogenatom (typically water) can be prevented from reducing the reliability ofthe transistor including the oxide semiconductor layer in a channelformation region.

Accordingly, a highly reliable light-emitting device including anorganic EL element can be provided. Further, a light-emitting devicewhich is unlikely to cause a defect in light emission can be provided.

One embodiment of the present invention is a method of manufacturing alight-emitting module including a first step of forming a light-emittingelement over a first substrate, a second step of forming a frame tosurround the light-emitting element and a sealing material to surroundthe frame over a second substrate, a third step of dripping a non-solidmaterial having viscosity which includes a drying agent that reacts withor adsorbs an impurity into a region surrounded by the frame, and afourth step of bonding the first substrate and the second substrateusing the sealing material, whereby the light-emitting element, thenon-solid material, and the frame are sealed inside.

In the above method of manufacturing a light-emitting module of oneembodiment of the present invention, subsequent to the step of drippinga non-solid material having viscosity which includes a drying agent thatreacts with or adsorbs an impurity into a region surrounded by theframe, the first substrate and the second substrate are bonded with thesealing material so that the light-emitting element, the frame, and thenon-solid material can be sealed inside.

Accordingly, the viscous material layer including the non-solid materialcan be efficiently formed between the first substrate and the secondsubstrate which are large substrates.

Accordingly, a highly reliable light-emitting module including anorganic EL element can be manufactured. Further, a light-emitting modulewhich is unlikely to cause a defect in light emission can bemanufactured.

One embodiment of the present invention is a method of manufacturing alight-emitting device including a first step of forming a transistor anda light-emitting element over a first substrate, a second step offorming a frame to surround the transistor and the light-emittingelement and a sealing material to surround the frame over a secondsubstrate, a third step of dripping a non-solid material havingviscosity which includes a drying agent that reacts with or adsorbs animpurity into a region surrounded by the frame, and a fourth step ofbonding the first substrate and the second substrate using the sealingmaterial, whereby the transistor, the light-emitting element, thenon-solid material, and the frame are sealed inside.

In the above method of manufacturing a light-emitting device of oneembodiment of the present invention, subsequent to the step of drippinga non-solid material having viscosity which includes a drying agent thatreacts with or adsorbs an impurity into a region surrounded by theframe, the first substrate and the second substrate are bonded with thesealing material so that the transistor, the light-emitting element, theframe, and the non-solid material can be sealed inside.

Accordingly, the viscous material layer including the non-solid materialcan be efficiently formed between the first substrate and the secondsubstrate which are large substrates.

Thus, a highly reliable light-emitting device including an organic ELelement can be manufactured. Further, a light-emitting device which isunlikely to cause a defect in light emission can be manufactured.

Note that in this specification, an “EL layer” refers to a layerprovided between a pair of electrodes in a light-emitting element. Thus,a light-emitting layer including an organic compound that is alight-emitting substance which is interposed between electrodes is onemode of the EL layer.

In this specification, in the case where a substance A is dispersed in amatrix formed using a substance B, the substance B forming the matrix isreferred to as host material while the substance A dispersed in thematrix is referred to as guest material. Note that the substance A andthe substance B may each be a single substance or a mixture of two ormore kinds of substances.

Note that a light-emitting device in this specification means an imagedisplay device, a light-emitting device, or a light source (including alighting device). In addition, the light-emitting device includes any ofthe following modules in its category: a module in which a connectorsuch as an FPC (flexible printed circuit), a TAB (tape automatedbonding) tape, or a TCP (tape carrier package) is attached to alight-emitting device; a module having a TAB tape or a TCP provided witha printed wiring board at the end thereof; and a module having an IC(integrated circuit) directly mounted over a substrate over which alight-emitting element is formed by a COG (chip on glass) method.

In accordance with one embodiment of the present invention, a highlyreliable light-emitting module including an organic EL element can beprovided.

Further, a light-emitting device using a highly reliable light-emittingmodule including an organic EL element can be provided.

Alternatively, a method of manufacturing a highly reliablelight-emitting module including an organic EL element can be provided.

Alternatively, a method of manufacturing a light-emitting device using ahighly reliable light-emitting module including an organic EL elementcan be provided.

BRIEF DESCRIPTION OF THE DRAWINGS

In the accompanying drawings:

FIGS. 1A and 1B illustrate a structure of a light-emitting moduleaccording to one embodiment of the present invention;

FIGS. 2A to 2C illustrate structures of a light-emitting moduleaccording to one embodiment of the present invention;

FIGS. 3A to 3C illustrate a light-emitting device according to oneembodiment of the present invention;

FIGS. 4A and 4B illustrate a light-emitting device according to oneembodiment of the present invention;

FIGS. 5A to 5D illustrate a method of manufacturing a light-emittingmodule according to one embodiment of the present invention;

FIGS. 6A to 6D illustrate a method of manufacturing a light-emittingdevice according to one embodiment of the present invention;

FIGS. 7A to 7E each illustrate a structure of a light-emitting elementaccording to one embodiment of the present invention;

FIGS. 8A to 8D illustrate a structure and a manufacturing method of atransistor one embodiment;

FIGS. 9A to 9C illustrate a light-emitting device according to oneembodiment of the present invention; and

FIGS. 10A to 10F illustrate electronic devices according to oneembodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Embodiments will be described in detail with reference to the drawings.Note that the present invention is not limited to the followingdescription. It will be easily understood by those skilled in the artthat modes and details thereof can be variously changed withoutdeparting from the spirit and the scope of the present invention.Therefore, the present invention should not be construed as beinglimited to the description in the following embodiments. Note that inthe structures of the invention described below, the same portions orportions having similar functions are denoted by the same referencenumerals in different drawings, and description of such portions is notrepeated.

Embodiment 1

In this embodiment, a light-emitting module of one embodiment of thepresent invention is described with reference to FIGS. 1A and 1B.

A structure of the light-emitting module of one embodiment of thepresent invention is illustrated in FIGS. 1A and 1B. FIG. 1A is a topview of the light-emitting module of one embodiment of the presentinvention, and FIG. 1B is a cross-sectional view along the lines A-B andC-D in FIG. 1A.

A light-emitting module 100 exemplified in FIGS. 1A and 1B has astructure in which a light-emitting element 110 and a viscous materiallayer 120 are sealed between a first substrate 101 and a secondsubstrate 102 with a sealing material 131 surrounding the light-emittingelement 110. The light-emitting element 110 includes a first electrode111, a second electrode 112, and therebetween, a layer 113 including anorganic compound having a light-emitting property. In addition, apartition 114 has an opening overlapping with the first electrode 111.The first electrode 111 is electrically connected to a first terminal103. The second electrode 112 is electrically connected to a secondterminal 104. The viscous material layer 120 is surrounded by a frame132 and provided in contact with the second electrode 112 between thefirst substrate 101 and the second substrate 102.

Note that a sealing film covering the light-emitting element 110 may beprovided between the light-emitting element 110 and the viscous materiallayer.

Viscous Material Layer

The viscous material layer 120 includes a drying agent and a non-solidmaterial having viscosity.

In addition, the viscous material layer 120 has fluidity. Preferably,the viscous material layer 120 includes a viscous material whoseviscosity is typically greater than or equal to 1 cp and less than orequal to 500 cp. When the viscosity of the viscous material is greaterthan or equal to 1 cp, the viscous material does not easily drop andconsequently it is possible to prevent, for example, a drop from anapplication device for the viscous material, which facilitatesmanufacture of the viscous material layer 120. When the viscosity of theviscous material is less than or equal to 500 cp, the stress applied bythe viscous material layer 120 to the second electrode 112 of thelight-emitting element 110 can be reduced. Accordingly, the drying agentcan be provided close to the light-emitting element 110 without damagingthe light-emitting element 110, so that dispersion of impurities intothe light-emitting element 110 can be effectively reduced. Thus, thereliability of the light-emitting element 110 can be effectivelyimproved.

Preferably, the drying agent includes a material which reacts with oradsorbs an impurity, typically a material which reacts with or adsorbswater and/or oxygen or a material which adsorbs water and/or oxygen.Note that the term impurity means a substance which reduces thereliability of the light-emitting element, typically water, oxygen, orthe like. Water, oxygen, or the like causes deterioration of the layerincluding an organic compound having a light-emitting property,impairing light-emitting characteristics of the light-emitting element.Examples of the material applicable to the drying agent are chemicallyadsorbing type drying agents such as oxides of alkali metals and oxidesof alkaline earth metals, physically adsorbing type drying agents suchas a zeolite, silica gel, aluminum oxide, and allophone, and the like.Note that when the drying agent which had reacted with an impuritygenerates gas or significantly changes in volume in the sealed space, astress is applied to the sealing structure (e.g., the sealing material),which may break the sealing structure. Physically adsorbing type dryingagents are preferably used, in which case reaction with or adsorption ofan impurity causes insignificant gas generation or a slight increase involume.

The non-solid material having viscosity can also be referred to asviscous non-solid material and has fluidity while containing the dryingagent. A material which does not dissolve the layer including an organiccompound having a light-emitting property or a material having lowvolatility is preferred. Examples of the material applicable to thenon-solid material having viscosity are straight silicone fluids,modified silicone fluids, liquid paraffins, perfluorocarbons, and thelike. Note that specific examples of straight silicone fluids aredimethyl silicone fluids, methyiphenyl silicone fluids, methyl hydrogensilicone fluids, and the like. Further, specific examples of modifiedsilicone fluids are silicone fluid in which an organic group isintroduced into a side chain, one or both ends of the main chain, orboth a side chain and the main chain of polysiloxane, such aspolyether-modified silicone fluids, methylstyryl-modified siliconefluids, alkyl-modified silicone fluids, fluids modified with higherfatty acid ester, fluids containing higher fatty acids, andfluorine-modified silicone fluids.

In the light-emitting module 100 described in this embodiment, theviscous material layer 120 includes a zeolite as the drying agent and asilicone fluid as the non-solid material having viscosity.

Frame

The frame 132 is in contact with the viscous material layer 120 whilesurrounding the viscous material layer 120 provided between the firstsubstrate 101 and the second substrate 102. The frame 132 may have asingle-layer structure or a layered structure including two or morelayers or may doubly surround the viscous material layer 120. Note thatthe distance between the first substrate 101 and the second substrate102 may be adjusted with use of the height of the frame 132 from eithersubstrate.

The frame 132 is a material which does not react with the viscousmaterial layer 120, preferably a material which does not easily allowentry of impurities. Examples of the material applicable to the frame132 are a photoresist, an acrylic resin, a polyimide, and the like.

In the light-emitting module 100 described in this embodiment, apolyimide is used for the frame 132.

Sealing Material

The sealing material 131 bonds the first substrate 101 and the secondsubstrate 102, and seals, between the first substrate 101 and the secondsubstrate 102, the light-emitting element 110 and the viscous materiallayer 120 surrounded by the frame 132. The sealing material 131 may havea single-layer structure or a layered structure including two or morelayers or may doubly surround the frame 132.

The sealing material 131 is a material which can bond the firstsubstrate 101 and the second substrate 102, preferably a material whichdoes not easily allow entry of impurities. Examples of the materialapplicable to the sealing material 131 are epoxy resins, siliconeresins, glass frit, glass ribbon, solder, and the like.

Note that when not a material which reacts with the viscous materiallayer 120, the sealing material 131 can also serve as the frame 132. Thesealing material 131 which also serves as the frame 132 is preferred inthat the kinds of materials used or manufacturing steps can be reduced.

In the light-emitting module 100 described in this embodiment, anultraviolet curable epoxy resin is used for the sealing material 131.

First Substrate and Second Substrate

The first substrate 101 and the second substrate 102 each have heatresistance high enough to resist the manufacturing process and are notparticularly limited in thickness and size as long as they can beapplied to a manufacturing apparatus. In addition, the first substrate101 and the second substrate 102 may have a single-layer structure or alayered structure including two or more layers.

The first substrate 101 and the second substrate 102 preferably have agas barrier property. A film having a gas barrier property may be formedbetween either substrate and the light-emitting element. Specifically,the first substrate 102 and the second substrate 102 preferably havesuch a gas barrier property that the water vapor permeability is lessthan or equal to 10⁻⁵ g/m²·day, preferably less than or equal to 10⁻⁶g/m²·day, in which case the reliability of the light-emitting module canbe improved.

The first substrate 101 and the second substrate 102 may haveflexibility. As a substrate having flexibility, other than a plasticsubstrate, thin glass having a thickness greater than or equal to 50 μmand less than or equal to 500 μm, or metal foil can be used.

Note that at least one of the first substrate 101 and the secondsubstrate 102 transmits light emitted from the light-emitting element.

Examples of a substrate which transmits visible light emitted from thelight-emitting element are no-alkali glass substrates, bariumborosilicate glass substrate, aluminoborosilicate glass substrates,quartz substrates, sapphire substrates, substrates includingfiberglass-reinforced plastics (FRP), polyester, acrylic, or polyimide,and the like.

For either the first substrate 101 or the second substrate 102, asubstrate which has difficulty in transmitting light emitted from thelight-emitting element formed over the first substrate may be used. Forexample, any of ceramic substrates and metal substrates containingstainless steel can be used.

A surface of the first substrate 101 over which the light-emittingelement is formed preferably has an insulating property. Further, aninsulating film may be stacked. The surface of the first substrate 101over which the light-emitting element is formed is preferably flat. Inaddition, a film for planarization may be formed between the firstsubstrate 101 the light-emitting element.

In the light-emitting module 100 described in this embodiment, anon-alkali glass substrate is used for each of the first substrate 101and the second substrate 102.

Light-Emitting Element

In the light-emitting element 110, the layer 113 including an organiccompound having a light-emitting property is provided between the firstelectrode 111 and the second electrode 112. Further, at least one of theelectrodes over a substrate which transmits light emitted from thelight-emitting element (specifically, the first electrode 111 or thesecond electrode 112) transmits light emitted from the layer 113including an organic compound having a light-emitting property. Notethat the detailed structure of the light-emitting element applicable tothe light-emitting module exemplified in this embodiment is describednot here but in Embodiment 6.

The light-emitting module 100 described in this embodiment includes thelight-emitting element 110 including a layer which emits white light asthe layer 113 including an organic compound having a light-emittingproperty.

Partition

The partition 114 is a layer that electrically insulates the firstelectrode 111 and the second electrode 112. The partition 114 may have asingle-layer structure or a layered structure including two or morelayers and is not particularly limited in thickness. In addition, thepartition 114 is preferably formed to have a curved surface withcurvature at an upper end portion or a lower end portion.

A material that can be used for the partition 114 is preferably amaterial which has an insulating property and has heat resistance highenough to resist the manufacturing process. For example, it is possibleto use an insulating layer formed of a material selected from aphotopolymer, (specifically, photosensitive acrylic, photosensitivepolyimide, and the like), an inorganic material film, an organicmaterial film, or an insulating layer including a material selected fromthe above materials.

In the light-emitting module 100 described in this embodiment, thepartition 114 is formed using positive photosensitive polyimide and hasa curved surface having a radius of curvature greater than or equal to0.2 μm and less than or equal to 3 μm at an upper end portion.

The light-emitting module of one embodiment of the present invention hasa structure in which the light-emitting element formed over the firstsubstrate and the viscous material layer are sealed in a space betweenthe first and second substrates which face each other, with the sealingmaterial surrounding the light-emitting element. The viscous materiallayer is surrounded by the frame, in contact with the light-emittingelement and provided between the first and second substrates, andincludes a non-solid material having viscosity and a drying agent thatreacts with an impurity (typically water and/or oxygen) or adsorbs animpurity.

Since the light-emitting element is enclosed by the first substrate, thesecond substrate, the sealing material bonding the first and secondsubstrates, and the viscous material layer, entry of impurities into thelight-emitting module can be reduced. Further, since the viscousmaterial layer is non-solid, it flows between the light-emitting elementand the second substrate. Accordingly, a stress applied to thelight-emitting element is reduced by the viscous material layer, so thatdamage to the light-emitting element can be prevented. Furthermore, thedrying agent included in the viscous material layer reacts with oradsorbs an impurity remaining in the light-emitting module and/or animpurity entering the light-emitting module from the outside of themodule. Accordingly, deterioration of the light-emitting element can beprevented. Further, the viscous material layer provided in contact withthe light-emitting element can release heat generated by driving of thelight-emitting element, to the second substrate, so that deteriorationof the light-emitting element caused by the heat can be reduced.Furthermore, a stress generated between the light-emitting element andthe second substrate because of a change in the size of thelight-emitting element due to the heat generation can be reduced by theviscous material layer between the light-emitting element and the secondsubstrate, so that damage to the light-emitting element can beprevented.

Because of a combined effect of the above, a highly reliablelight-emitting module including an organic EL element can be provided.Further, a light-emitting module which is unlikely to cause a defect inlight emission can be provided.

Modification Example 1

A modification example of the light-emitting module exemplified in thisembodiment is described with reference to FIG. 2A. The upper part ofFIG. 2A is a top view of the light-emitting module of one embodiment ofthe present invention and the lower part is a cross-sectional view alongthe cutting plane line A-B. A light-emitting module 200 a of oneembodiment of the present invention has a structure in which alight-emitting element 210 formed over a first substrate 201 and aviscous material layer 220 are sealed in a space between the firstsubstrate 201 and a second substrate 202 which face each other, with asealing material 231 surrounding the light-emitting element 210. Theviscous material layer 220 is surrounded by a frame 232 and provided incontact with the second electrode of the light-emitting element 210 and(the electrode on the side opposite to the side in contact with thefirst substrate 201, although not illustrated) between the firstsubstrate 201 and the second substrate 202, and includes a non-solidmaterial having viscosity and a drying agent that reacts with animpurity (typically water and/or oxygen) or adsorbs an impurity. Inaddition, the frame 232 surrounds a first space 241 overlapping with thelight-emitting element 210 and a second space 242 connected to the firstspace 241 through a narrow portion 245. At least a portion 242 b of thesecond space 242 is not filled with the viscous material layer 220.

The narrow portion allows the viscous material layer to flow between thefirst space and the second space. The narrow portion also prevents theportion 242 b in the second space which is not filled with the viscousmaterial layer from moving toward the first space. The shape of thesecond space is not limited to the shape which extends from the narrowportion. For example, the second space may have a tubular shape with across section having substantially the same area as the narrow portionor may have a meandering shape to have a sufficient volume.

Note that a plurality of second spaces can also be provided in thelight-emitting module. The plurality of separate second spaces allowsmore flexibility in the layout of the light-emitting module, which canprovide additional values. A light-emitting module 200 b exemplified inFIG. 2B includes the two second spaces.

Since the light-emitting element is enclosed by the first substrate, thesecond substrate, the sealing material bonding the first and secondsubstrates, and the viscous material layer, entry of impurities into thelight-emitting module can be reduced. Further, since the viscousmaterial layer is non-solid, it flows between the light-emitting elementand the second substrate. Accordingly, a stress applied to thelight-emitting element is reduced by the viscous material layer, so thatdamage to the light-emitting element can be prevented.

Furthermore, the drying agent included in the viscous material layerreacts with or adsorbs an impurity remaining in the light-emittingmodule and/or an impurity entering the light-emitting module from theoutside of the module. Accordingly, deterioration of the light-emittingelement can be prevented. Further, the viscous material layer providedin contact with the light-emitting element can release heat generated bydriving of the light-emitting element, to the second substrate, so thatdeterioration of the light-emitting element caused by the heat can bereduced.

Furthermore, with the viscous material layer between the light-emittingelement and the second substrate, a change in the size of thelight-emitting element by expansion due to heat generation can becompensated for, which can prevents a stress generated between thelight-emitting element and the second substrate from concentrating atthe light-emitting element. Accordingly, damage to the light-emittingelement can be prevented.

In addition, the portion in the second space which is connected to thefirst space through the narrow portion and is not filled with theviscous material layer can compensate for a change in the volume of theviscous material layer due to heat generation in the light-emittingmodule or can reduce a stress due to the volume change. Accordingly, itis possible to prevent the phenomenon in which the viscous materiallayer expands to break the sealing structure (e.g., the bond structureof the sealing material) of the light-emitting module. Furthermore, evenwhen a chemical adsorption drying agent such as an oxide of an alkalimetal or an oxide of an alkaline earth metal reacts with impurities togenerate a gas or increases in volume in a sealed space, the volumechange can be compensated for by the portion in the second space whichis not filled with the viscous material layer.

Modification Example 2

As another modification example of the light-emitting module exemplifiedin this embodiment, a light-emitting module in which the secondelectrode 112, the viscous material layer 120, and the second substrate102 each transmit light emitted from the layer 113 including an organiccompound having a light-emitting property is described.

The viscous material layer 120 preferably transmits 95% or more of lightemitted from the layer 113 including an organic compound having alight-emitting property, more preferably greater than or equal to 98%and less than 100% thereof so that light emitted from the light-emittingelement 110 can be effectively extracted through the second substrate102. Specifically, the viscous material layer 120 can have a visiblelight transmittance of 99% when formed to a thickness of 10 μm using asilicone fluid as the non-solid material having viscosity.

The refractive index of the viscous material layer 120 is especiallypreferably greater than or equal to the refractive index of the air,preferably greater than or equal to 1.3 and less than or equal to 1.7,more preferably greater than or equal to 1.4 and less than or equal to1.6, and is preferably greater than or equal to the refractive index ofthe layer 113 including an organic compound having a light-emittingproperty and less than or equal to that of the second substrate 102.This is in order that light emitted from the light-emitting element 110can be efficiently extracted to the outside through the second substrate102.

Further, a portion which is not filled with the viscous material layermay be provided between the viscous material layer 120 and the frame132. The portion which is not filled with the viscous material layer ispreferably provided in that a stress generated when the viscous materiallayer 120 expands due to heat can be reduced.

Note that a sealing film covering the light-emitting element 110 may beprovided between the light-emitting element 110 and the viscous materiallayer. The refractive index of the sealing film is preferably greaterthan or equal to the refractive index of the viscous material layer andless than or equal to that of the layer including an organic compoundhaving a light-emitting property. The thickness of the sealing film ispreferably greater than or equal to 1 nm and less than or equal to 500nm.

In the light-emitting module of one embodiment of the present invention,components from the second electrode of the light-emitting element tothe second substrate are each formed using a material having alight-transmitting property. Consequently, light emitted from thelight-emitting element can be extracted through the second substrate. Inaddition, the second electrode of the light-emitting element and thesecond substrate are optically connected to each other by the viscousmaterial layer, so that light emitted from the layer including anorganic compound having a light-emitting property can be efficientlyextracted through the second substrate. Accordingly, a light-emittingmodule having high emission efficiency can be provided. Further, alight-emitting module having lower power consumption can be provided.Further, a light-emitting module having high reliability can beprovided. Further, a light-emitting module which is unlikely to cause adefect in light emission can be provided.

Modification Example 3

As a modification example of the light-emitting module exemplified inthis embodiment, a light-emitting module in which the median particlesize of the drying agent included in the viscous material layer 120 isgreater than or equal to 10 nm and less than or equal to 400 nm isdescribed.

The light-emitting module of one embodiment of the present inventionincludes the drying agent having a median particle size greater than orequal to 10 nm and less than or equal to 400 nm. The drying agent havinga median particle size greater than or equal to 10 nm can inhibitbreakdown of an adsorption site in it. The drying agent having a medianparticle size less than or equal to 400 nm can have such a large surfacearea as to easily react with and/or adsorb an impurity. Note that whenthe median particle size of the drying agent is less than or equal to400 nm, although aggregation of the drying agent occurs easily in theviscous material layer, the aggregation can be prevented with a surfaceof the drying agent which is modified with a silane coupling agent.Alternatively, the aggregation can be prevented by ultrasonic waveirradiation when the drying agent is dispersed in the viscous materiallayer.

Furthermore, when the median particle size of the drying agent includedin the viscous material layer 120 is greater than or equal to 10 nm andless than or equal to 400 nm in the structure in which the secondelectrode 112, the viscous material layer 120, and the second substrate102 each transmit light emitted from the layer 113 including an organiccompound having a light-emitting property, the phenomenon in which lightemitted by the organic compound having a light-emitting property isscattered in the viscous material layer can be inhibited. Accordingly, alight-emitting module having high emission efficiency can be provided.Further, a highly reliable light-emitting module including an organic ELelement can be provided. Further, a light-emitting module which isunlikely to cause a defect in light emission can be provided.

Modification Example 4

A modification example of the light-emitting module exemplified in thisembodiment is described with reference to FIG. 2C. The upper part ofFIG. 2C is a top view of the light-emitting module of one embodiment ofthe present invention and the lower part is a cross-sectional view alongthe cutting plane line A-B. A light-emitting module 200 c of oneembodiment of the present invention includes, between the light-emittingelement 210 and the frame 232, an activation material layer 246including an activation material which can activate the drying agentincluded in the viscous material layer 220.

In such a structure, the viscous material layer having fluidity flows ina space to be surrounded by the frame surrounding the light-emittingelement. The drying agent included in the viscous material layer reactswith or adsorbs an impurity between the second electrode of thelight-emitting element and the second substrate. Then, the drying agentwhich have reacted with or adsorbed an impurity comes in contact withthe activation material layer provided between the light-emittingelement and the frame, and is reactivated. Accordingly, a highlyreliable light-emitting module including an organic EL element can beprovided. Further, a light-emitting module which is unlikely to cause adefect in light emission can be provided.

Note that a recyclable drying agent is used for the viscous materiallayer. An example of the recyclable drying agent is a physicallyadsorbing type drying agent. As the activation material used for theactivation material layer, a material which can extract physicallyadsorbed impurities such as moisture is necessary. Specifically,chemically adsorbing type drying agents such as oxides of alkali metalsand oxides of alkaline earth metals is used as the activation material.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 2

In this embodiment, a light-emitting device in which a plurality oflight-emitting modules of one embodiment of the present invention isarranged in a matrix is described with reference to FIGS. 3A to 3C.

In this embodiment, an active matrix light-emitting device in which thelight-emitting modules of one embodiment of the present invention areeach connected to a transistor is described. However, the embodiment ofthe present invention is not limited to the active matrix light-emittingdevice and can also be applied to a passive matrix light-emittingdevice. Further, either light-emitting device can be used for a displaydevice or a lighting device.

Active Matrix Light-Emitting Device

FIGS. 3A to 3C illustrate structures of the active matrix light-emittingdevice of one embodiment of the present invention. Note that FIG. 3A isa top view of the light-emitting device of one embodiment of the presentinvention, and FIG. 3B is a cross-sectional view taken along the linesA-B and C-D in FIG. 3A. A light-emitting device 1400 illustrated in FIG.3B emits light in the direction denoted by the arrow in the drawing.

The active matrix light-emitting device 1400 includes a driver circuitportion (source driver circuit) 1401, a pixel portion 1402, a drivercircuit portion (gate driver circuit) 1403, a second substrate 1404, anda sealing material 1405 (see FIGS. 3A and 3B). Note that a frame 1406 isprovided to be surrounded by the sealing material 1405 while a spacesurrounded by the frame 1406 includes a viscous material layer 1407.

The light-emitting device 1400 receives a video signal, a clock signal,a start signal, a reset signal, and the like from a flexible printedcircuit (FPC) 1409 that is an external input terminal. Note that onlythe FPC is illustrated here; however, the FPC may be provided with aprinted wiring board (PWB). The light-emitting device in thisspecification includes, in its category, not only the light-emittingdevice itself but also the light-emitting device provided with the FPCor the PWB.

The detail of the structure of the light-emitting device 1400 isdescribed with reference to the cross-sectional view in FIG. 3B. Thelight-emitting device 1400 includes, over a first substrate 1410, adriver circuit portion including the source driver circuit 1401illustrated and the pixel portion 1402 including a pixel which is alsoillustrated. Further, the light-emitting device 1400 includes a leadwiring 1408 for transmitting signals that are to be input to the sourcedriver circuit 1401 and the gate driver circuit 1403.

Note that although the source driver circuit 1401 including a CMOScircuit in which an n-channel transistor 1423 and a p-channel transistor1424 are combined is exemplified in this embodiment, the driver circuitis not limited to this structure and may be any of a variety ofcircuits, such as a CMOS circuit, a PMOS circuit, or an NMOS circuit.Although this embodiment illustrates the driver-integrated type in whichthe driver circuits are formed over the substrate, the present inventionis not limited to this, and the driver circuits may be formed outsidethe substrate, not over the substrate.

Transistor Structure 1

The active matrix light-emitting device exemplified in this embodimentcan be formed by using a variety of transistors. Specifically, for aregion where a channel is formed, a transistor using amorphous silicon,polysilicon, single crystal silicon, an oxide semiconductor, or the likecan be used.

Use of a single crystal semiconductor for the region where a channel ofa transistor is formed can reduce the size of the transistor, whichresults in higher resolution pixels in a display portion.

As a single crystal semiconductor used for forming a semiconductorlayer, it is possible to use a semiconductor substrate, typical examplesof which are a single crystal semiconductor substrate including anelement belonging to Group 14, such as a single crystal siliconsubstrate, a single crystal germanium substrate, or a single crystalsilicon germanium substrate, and a compound semiconductor substrate(e.g., a SiC substrate, a sapphire substrate, and a GaN substrate).Preferably, a silicon on insulator (SOI) substrate in which a singlecrystal semiconductor layer is provided on an insulating surface isused.

As a method of forming the SOI substrate, any of the following methodscan be used: a method in which oxygen ions are implanted into amirror-polished wafer and then heating is performed at high temperature,whereby an oxide layer is formed at a certain depth from a surface ofthe wafer and a defect caused in the surface layer is eliminated; amethod in which a semiconductor substrate is separated by utilizing thegrowth of microvoids, which are formed by hydrogen ion irradiation, byheat treatment; a method in which a single crystal semiconductor layeris formed on an insulating surface by crystal growth; and the like.

In this embodiment, ions are added through one surface of a singlecrystal semiconductor substrate, and an embrittlement layer is formed ata certain depth from the surface of the single crystal semiconductorsubstrate. Then, an insulating layer is formed over the surface of thesingle crystal semiconductor substrate or over the first substrate 1410.Next, heat treatment is performed in the state in which the singlecrystal semiconductor substrate provided with the embrittlement layerand the first substrate 1410 are bonded to each other with theinsulating layer interposed therebetween, so that a crack is generatedin the embrittlement layer to separate the single crystal semiconductorsubstrate along the embrittlement layer. Thus, a single crystalsemiconductor layer, which is separated from the single crystalsemiconductor substrate, is formed as a semiconductor layer over thefirst substrate 1410. Note that a glass substrate can be used as thefirst substrate 1410.

Further, regions electrically insulated from each other may be formed inthe semiconductor substrate so that transistors 1411 and 1412 may beformed using the regions electrically insulated from each other.

The use of the single crystal semiconductor as the channel formationregion can reduce variation in the electric characteristics oftransistors, such as threshold voltage, due to a bonding defect at acrystal grain boundary. Hence, in the light-emitting device of oneembodiment of the present invention, the light-emitting element canoperate normally without a circuit for compensating the thresholdvoltage in each pixel. Accordingly, the number of circuit elements inone pixel can be reduced, which increases the flexibility of layout.Thus, a high-resolution light-emitting device can be achieved. Forexample, a light-emitting device having a matrix of a plurality ofpixels, specifically 350 or more pixels per inch (i.e., the horizontalresolution is 350 or more pixels per inch (ppi)), preferably 400 or morepixels per inch (i.e., the horizontal resolution is 400 or more ppi),can be achieved.

Moreover, a transistor whose channel formation region is formed using asingle crystal semiconductor can be reduced in size while maintaininggood current drive capability. The use of the transistor reduced in sizeleads to a reduction in the area of a circuit portion that does notcontribute to display operation, resulting in an increase in the area ofa region of the display portion where an image is displayed and areduction in the frame size of the light-emitting device.

Pixel Portion Structure 1

The pixel portion 1402 includes a plurality of pixels. Each pixelincludes a light-emitting element 1418, the current control transistor1412 whose drain electrode is connected to a first electrode 1413 of thelight-emitting element 1418, and the switching transistor 1411.

The light-emitting element 1418 provided in the light-emitting moduleincludes the first electrode 1413, a second electrode 1417, and a layer1416 including an organic compound having a light-emitting property.Note that a partition 1414 is formed to cover an edge portion of thefirst electrode 1413.

Further, the partition 1414 is formed such that an upper edge portion ora lower edge portion thereof has a curved surface with a curvature. Thepartition 1414 can be formed using either a negative photosensitiveresin which becomes insoluble in an etchant by light irradiation or apositive photosensitive resin which becomes soluble in an etchant bylight irradiation. For example, in the case of using positivephotosensitive acrylic as a material for the partition 1414, it ispreferable that the partition 1414 be formed to have a curved surfacewith a radius of curvature (0.2 μm to 3 μm) only at the upper edgeportion thereof. Here, the partition 1414 is formed using a positivephotosensitive polyimide film.

As a structure of the light-emitting element 1418, a structure of thelight-emitting element exemplified in Embodiment 6 can be employed, forexample.

Specifically, the layer 1416 including an organic compound having alight-emitting property can emit white light. A light-emitting modulewhich provides light of different emission colors can be formed in sucha way that color filters are provided to overlap with light-emittingelements which exhibit white light.

For example, when color filters which can transmit light of differentcolors are provided to overlap with light-emitting elements, a pluralityof light-emitting modules which provides light of different colors canbe provided without separately forming layers each including an organiccompound having a light-emitting property for the individuallight-emitting elements. In addition, when such light-emitting modulesare formed to be capable of being driven independently of each other, amulticolor display device can be formed.

In addition, when a film having a light-blocking property (also referredto as black matrix) is provided to overlap with the partition, theamount of light from an adjacent light-emitting element, which entersone color filter, can be reduced. Accordingly, the color reproducibilityof the display device can be improved.

In this embodiment, the case where light emitted from the light-emittingelement 1418 is extracted through the second electrode 1417 isdescribed. Specifically, the case where the second electrode 1417 isformed using an electrically conductive film which can transmit lightemitted from the layer 1416 including an organic compound having alight-emitting property is described.

In this embodiment, the case where a microresonator (also referred to asmicrocavity) is formed using the first electrode 1413 and the secondelectrode 1417 in the light-emitting element 1418 is described. Forexample, the first electrode 1413 is formed using an electricallyconductive film which reflects light emitted from the layer 1416including an organic compound having a light-emitting property, and thesecond electrode 1417 is formed using a semi-transmissive andsemi-reflective, electrically conductive film which reflects part of thelight and transmits part of the light.

In addition, an optical adjustment layer can be provided between thefirst and second electrodes. The optical adjustment layer adjusts theoptical path length between the reflective first electrode 1413 and thesemi-transmissive and semi-reflective second electrode 1417. Byadjustment of the thickness of the optical adjustment layer, thewavelength of light which is preferentially extracted through the secondelectrode 1417 can be controlled.

The layer including an organic compound having a light-emitting propertycan be employed for a material that can be used for the opticaladjustment layer. For example, a charge generation region may be used tocontrol the thickness of the optical adjustment layer. A regioncontaining a substance having a high hole-transport property and anacceptor substance is especially preferably used for the opticaladjustment layer, in which case an increase in drive voltage can beinhibited even when the optical adjustment layer is thick.

Alternatively, for a material that can be used for the opticaladjustment layer, an electrically conductive film having alight-transmitting property which transmits light emitted from the layer1416 including an organic compound having a light-emitting property canalso be employed. For example, an electrically conductive film having alight-transmitting property is stacked over a surface of a reflective,electrically conductive film so that the first electrode 1413 can beformed. This structure is suitable for a reduction in the size of thedisplay device in that the thicknesses of the optical adjustment layersover adjacent first electrodes can be varied by a photolithographyprocess.

When light emitted from the light-emitting element 1418 is extractedthrough the second electrode 1417, the color filter 1434 and a film 1435having a light-blocking property can be provided over the secondsubstrate 1404.

Note that the distance between the second substrate 1404 provided withthe color filter 1434 and the first substrate can be adjusted using thelater-described sealing material 1405, the frame 1406, or the like. Thecolor filter 1434 is preferably provided close to the light-emittingelement 1418. When the distance between color filters is less than orequal to the distance between adjacent light-emitting elements (thewidth of a partition), the amount of light from an adjacentlight-emitting element, which enters one color filter, from the adjacentlight-emitting element can be reduced. Accordingly, the colorreproducibility of the display device can be improved.

Note that the partition 1414 having a light-blocking property caninhibit reflection of external light by a reflective film provided inthe light-emitting module. The reflection of external light by areflective film which extends outside the light-emitting element 1418leads to the lower contrast by the light-emitting device; for thatreason, bright light emission is hindered. When the partition has alight-blocking property, a resin layer colored in black can be used toform it.

Sealing Structure 1

The light-emitting device 1400 exemplified in this embodiment has astructure in which the light-emitting element 1418 is sealed in a spaceenclosed by the first substrate 1410, the second substrate 1404, and thesealing material 1405.

The frame 1406 is provided in the space and surrounds the light-emittingelement 1418 and the viscous material layer 1407. The space may betightly filled with the viscous material layer 1407 or a portion whichis not filled with it may remain in part of the space. The remainingportion may be filled with an inert gas (e.g., nitrogen or argon). Theportion filled with an inert gas is preferably provided in that a stressgenerated when the viscous material layer 1407 expands due to heat canbe reduced. Further, an adsorbent which adsorbs an impurity, such as adrying agent, may be provided in the remaining portion.

The light-emitting device of one embodiment of the present invention hasa structure in which the transistor formed over the first substrate, thelight-emitting element which is formed over the first substrate andconnected to the transistor, and the viscous material layer are sealedin a space between the first and second substrates which face eachother, with the sealing material surrounding the light-emitting element.The viscous material layer is surrounded by the frame, in contact withthe light-emitting element and provided between the first and secondsubstrates, and includes a non-solid material having viscosity and adrying agent that reacts with an impurity (typically water and/oroxygen) or adsorbs an impurity.

Since the light-emitting element is enclosed by the first substrate, thesecond substrate, the sealing material bonding the first and secondsubstrates, and the viscous material layer, entry of impurities into thelight-emitting device can be reduced. Further, since the viscousmaterial layer is non-solid, it flows between the light-emitting elementand the second substrate. Accordingly, a stress applied to thelight-emitting element is reduced by the viscous material layer, so thatdamage to the light-emitting element can be prevented. Furthermore, thedrying agent included in the viscous material layer reacts with oradsorbs an impurity remaining in the light-emitting device and/or animpurity entering the light-emitting device from the outside of thedevice. Accordingly, deterioration of the light-emitting element can beprevented. Further, the viscous material layer provided in contact withthe light-emitting element can release heat generated by driving of thelight-emitting element, to the second substrate, so that deteriorationof the light-emitting element caused by the heat can be reduced.Furthermore, a stress generated between the light-emitting element andthe second substrate because of a change in the size of thelight-emitting element due to the heat generation can be reduced by theviscous material layer between the light-emitting element and the secondsubstrate, so that damage to the light-emitting element can beprevented.

Accordingly, a highly reliable light-emitting device including anorganic EL element can be provided. Further, a light-emitting devicewhich is unlikely to cause a defect in light emission can be provided.

Modification Example

As a modification example of the light-emitting device exemplified inthis embodiment, a light-emitting device which includes a transistorincluding an oxide semiconductor layer in a channel formation region andin which the transistor and the viscous material layer are sealed with asealing material surrounding a light-emitting element is described withreference to FIG. 3C. Note that the viscous material layer includes adrying agent which can react with or adsorb an impurity (typicallywater) and a non-solid material having viscosity

The light-emitting device exemplified in FIG. 3C includes, over thefirst substrate 1410, a driver circuit portion including the sourcedriver circuit 1401 illustrated and the pixel portion 1402 including apixel which is also illustrated. Further, the light-emitting deviceincludes the lead wiring 1408 for transmitting signals that are to beinput to the source driver circuit 1401 and the gate driver circuit1403.

Note that in this modification example, a structure including a circuitin which an n-channel transistor 1423 b is used for the source drivercircuit 1401 is exemplified. Although a driver-integrated type in whichthe driver circuits are formed over the substrate is described in thismodification example, the driver circuits are not necessarily formedover the substrate but can be formed outside it.

Transistor Structure 2

In the modification example of the active matrix light-emitting deviceexemplified in this embodiment, the transistor using an oxidesemiconductor in a region where a channel is formed is employed.

The transistor using an oxide semiconductor in a region where a channelis formed facilitates manufacture over a large substrate and enableshigher-speed operation as compared with a transistor using amorphoussilicon.

As a structure of the transistor using an oxide semiconductor in aregion where a channel is formed, a structure of a transistorexemplified in Embodiment 7, for example, can be used.

Note that a hydrogen ion or a hydrogen molecule in the oxidesemiconductor acts as an impurity which increases the carrierconcentration in the oxide semiconductor. Consequently, dispersion of animpurity including a hydrogen atom in the transistor using an oxidesemiconductor in a region where a channel is formed impairs theproperties of the transistor and even eliminates the reliability of thelight-emitting device using the transistor. The impurity including ahydrogen atom remains in and/or enters the light-emitting device usingthe oxide semiconductor from the outside of the device. In particular,it is difficult to completely remove moisture from the light-emittingdevice and/or to completely prevent entry of moisture from the air.

Pixel Portion Structure 2

The pixel portion 1402 exemplified in FIG. 3C includes a plurality ofpixels. Each pixel includes the light-emitting element 1418 and thecurrent control transistor 1412 b whose source electrode or drainelectrode is connected to the first electrode 1413 of the light-emittingelement 1418. In the modification example of the active matrixlight-emitting device exemplified in this embodiment, the transistorusing an oxide semiconductor in a region where a channel is formed isemployed.

Note that the distance between the second substrate 1404 provided withthe color filter 1434 and the first substrate can be adjusted using thesealing material 1405, a spacer 1433, or the like.

The spacer 1433 can be formed over the partition 1414 by aphotolithography process, for example. The spacer 1433 provided in thepixel portion blocks at least part of light emitted from thelight-emitting element 1418, so that entry of light to a color filterprovided in an adjacent pixel (this phenomenon can also be referred toas optical crosstalk) can be reduced.

Further, the color filter 1434 is preferably provided close to thelight-emitting element 1418. When the distance between color filters isless than or equal to the distance between adjacent light-emittingelements (the width of the partition), the amount of light from anadjacent light-emitting element, which enters one color filter, can bereduced. Accordingly, the color reproducibility of the light-emittingdevice can be improved. Further, in the light-emitting deviceexemplified in the modification example of this embodiment, since thespacer 1433 is provided in the pixel portion, the distance between thecolor filter 1434 and the light-emitting element 1418 can be uniformlyadjusted in the pixel portion.

Sealing Structure 2

The light-emitting device exemplified in FIG. 3C has a structure inwhich the light-emitting element 1418 is sealed in a space enclosed bythe first substrate 1410, the second substrate 1404, and a sealingmaterial 1405 b.

The light-emitting element 1418 and the viscous material layer 1407 areprovided in the space. The sealing material 1405 b surrounds thelight-emitting element 1418 and the viscous material layer 1407. Inother words, the sealing material 1405 b included in the light-emittingdevice exemplified in FIG. 3C have both functions of the sealingmaterial 1405 and the frame 1406 which are included in thelight-emitting device exemplified in FIG. 3B. Specifically, the sealingmaterial 1405 b included in the light-emitting device exemplified inFIG. 3C has the effect of bonding the first substrate 1410 and thesecond substrate 1404 and to seal, therebetween, the light-emittingelement 1418 and the viscous material layer 1407.

For the sealing material 1405 b, a material which does not react withthe viscous material layer 1407 is used. Specific examples of thematerial applicable to the sealing material 1405 b are glass frit, glassribbon, and the like.

Note that the space may be tightly filled with the viscous materiallayer 1407 or a portion which is not filled with it may remain in partof the space. The remaining portion may be filled with an inert gas(e.g., nitrogen or argon). The portion filled with an inert gas ispreferably provided in that a stress generated when the viscous materiallayer 1407 expands due to heat can be reduced. Further, an adsorbentwhich adsorbs an impurity, such as a drying agent, may be provided inthe remaining portion.

Viscous Material Layer

The viscous material layer 1407 includes a drying agent and a non-solidmaterial having viscosity. In addition, the viscous material layer 1407has fluidity and includes a viscous material whose viscosity ispreferably typically greater than or equal to 1 cp and less than orequal to 500 cp.

The drying agent includes a material which reacts with or adsorbs animpurity, preferably, typically a material which reacts with or adsorbswater and/or oxygen or a material which adsorbs water and/or oxygen.Note that in the modification example of the light-emitting deviceexemplified in this embodiment, the impurity means not only a substancewhich reduces the reliability of the light-emitting element but also asubstance which increases the carrier concentration in the oxidesemiconductor used for the region of the transistor where a channel isformed. Typical examples of the impurity are a hydrogen ion, a hydrogenmolecule, and the like, in addition to water and oxygen. Examples of thematerial applicable to the drying agent are chemically adsorbing typedrying agents such as oxides of alkali metals and oxides of alkalineearth metals, physically adsorbing type drying agents such as a zeolite,silica gel, aluminum oxide, and allophone, and the like.

The non-solid material having viscosity has fluidity while containingthe drying agent. Examples of the material applicable to the non-solidmaterial having viscosity are straight silicone fluids, modifiedsilicone fluids, liquid paraffins, perfluorocarbons, and the like.

Since the transistor including the oxide semiconductor layer in achannel formation region and the light-emitting element are enclosed bythe first substrate, the second substrate, the sealing material bondingthe first and second substrates, and the viscous material layer, entryof impurities into the light-emitting device can be reduced.Furthermore, the drying agent included in the viscous material layerreacts with or adsorbs an impurity remaining in the light-emittingdevice and/or an impurity entering the light-emitting device from theoutside of the device. Accordingly, an impurity including a hydrogenatom (typically water) can be prevented from reducing the reliability ofthe transistor including the oxide semiconductor layer in a channelformation region.

Accordingly, a highly reliable light-emitting device including anorganic EL element can be provided. Further, a light-emitting devicewhich is unlikely to cause a defect in light emission can be provided.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 3

In this embodiment, a light-emitting device in which a plurality oflight-emitting modules of one embodiment of the present invention isarranged in a matrix is described with reference to FIGS. 4A and 4B.Note that the light-emitting device exemplified in this embodimentincludes a first space overlapping with a pixel portion and a secondspace connected to the first space through a narrow portion.

In this embodiment, an active matrix light-emitting device in which thelight-emitting modules of one embodiment of the present invention areeach connected to a transistor is described. However, the embodiment ofthe present invention is not limited to the active matrix light-emittingdevice and can also be applied to a passive matrix light-emittingdevice. Further, either light-emitting device can be used for a displaydevice or a lighting device.

Active Matrix Light-Emitting Device

FIGS. 4A and 4B illustrate a structure of the active matrixlight-emitting device of one embodiment of the present invention. Notethat FIG. 4A is a top view of the light-emitting device of oneembodiment of the present invention, and FIG. 4B is a cross-sectionalview taken along the lines A-B and C-D in FIG. 4A. A light-emittingdevice 2400 illustrated in FIG. 4B emits light in the direction denotedby the arrow in the drawing.

The active matrix light-emitting device 2400 includes a driver circuitportion (source driver circuit) 2401, a pixel portion 2402, a drivercircuit portion (gate driver circuit) 2403, a second substrate 2404, anda sealing material 2405 (see FIGS. 4A and 4B). Note that a frame 2406 isprovided to be surrounded by the sealing material 2405 while a spacesurrounded by the frame 2406 includes a viscous material layer 2407.Further, the frame 2406 surrounds a first space 2441 overlapping withthe pixel portion 2402 and a second space 2442 overlapping with thedriver circuits 2401 and 2403. The first space 2441 and the second space2442 are connected through the narrow portion 2406 a. At least a portion2442 a of the second space 2442 is not filled with the viscous materiallayer 2407.

The narrow portion 2406 a is an opening provided in the frame 2406 andallows the viscous material layer 2407 to flow between the first space2441 and the second space 2442. The narrow portion 2406 a also preventsthe portion 2442 a provided in the second space 2442 which is not filledwith the viscous material layer from moving toward the first space 2441.Note that the cross-sectional shape of the second space 2442 is notlimited to the shape which extends from the narrow portion 2406 a. Forexample, the second space 2442 may have a tubular shape with a crosssection having substantially the same area as the narrow portion or mayhave a meandering shape to have a sufficient volume.

Since the pixel portion 2402 is enclosed by the first substrate 2410,the second substrate 2404, the sealing material 2405 bonding the firstsubstrate 2410 and the second substrate 2404, and the viscous materiallayer 2407, entry of impurities into the light-emitting device 2400 canbe inhibited. Further, since the viscous material layer 2407 is anon-solid material, it flows between the light-emitting element 2418 andthe second substrate 2404. Accordingly, a stress applied to thelight-emitting element 2418 is reduced by the viscous material layer2407, so that damage to the light-emitting element 2418 can beprevented.

Furthermore, a drying agent included in the viscous material layer 2407reacts with or adsorbs an impurity remaining in the light-emittingdevice 2400 and/or an impurity entering the light-emitting device 2400from the outside. Accordingly, deterioration of the light-emittingelement 2418 can be prevented. Further, heat generated by driving of thelight-emitting element 2418 can be released to the second substrate2404, so that deterioration of the light-emitting element 2418 caused bythe heat can be reduced.

Furthermore, a stress generated between the light-emitting element 2418and the second substrate 2404 because of a change in the size of thelight-emitting element due to the heat generation can be reduced by theviscous material layer 2407 provided between the light-emitting element2418 and the second substrate 2404, so that damage to the light-emittingdevice 2400 can be prevented.

In addition, the portion in the second space which is connected to thefirst space through the narrow portion and is not filled with theviscous material layer can compensate for a change in the volume of theviscous material layer 2407 due to the heat generation in thelight-emitting module or can reduce a stress due to the volume change.Accordingly, it is possible to prevent the phenomenon in which theviscous material layer 2407 expands to break the sealing structure(e.g., the bond structure of the sealing material 2405) of thelight-emitting device.

The light-emitting device 2400 receives a video signal, a clock signal,a start signal, a reset signal, and the like from an FPC (flexibleprinted circuit) 2409 that is an external input terminal. Note that onlythe FPC is illustrated here; however, the FPC may be provided with aprinted wiring board (PWB). The light-emitting device in thisspecification includes, in its category, not only the light-emittingdevice itself but also the light-emitting device provided with the FPCor the PWB.

The detail of the structure of the light-emitting device 2400 isdescribed with reference to the cross-sectional view in FIG. 4B. Thelight-emitting device 2400 includes, over the first substrate 2410, adriver circuit portion including the source driver circuit 2401illustrated and the pixel portion 2402 including a pixel which is alsoillustrated. Further, the light-emitting device 2400 includes a leadwiring 2408 for transmitting signals that are to be input to the sourcedriver circuit 2401 and the gate driver circuit 2403.

Note that although the source driver circuit 2401 including a CMOScircuit in which an n-channel transistor 2423 and a p-channel transistor2424 are combined is exemplified in this embodiment, the driver circuitis not limited to this structure and may be any of a variety ofcircuits, such as a CMOS circuit, a PMOS circuit, or an NMOS circuit.Although this embodiment illustrates the driver-integrated type in whichthe driver circuits are formed over the substrate, the present inventionis not limited to this, and the driver circuits may be formed outsidethe substrate, not over the substrate.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 4

In this embodiment, a method of manufacturing a light-emitting module ofone embodiment of the present invention is described. Specifically, amanufacturing method in which, subsequent to the step of dripping anon-solid material having viscosity which includes a drying agent thatreacts with or adsorbs an impurity into a region surrounded by a frame,a first substrate and a second substrate are bonded with a sealingmaterial so that a light-emitting element, the frame, and the non-solidmaterial can be sealed inside is described with reference to FIGS. 5A to5D.

First Step

First, the light-emitting element 210 is formed over the first substrate201 (see FIG. 5A). Note that in FIGS. 5A to 5D, the detailed structureof the light-emitting element 210 (a first terminal, a second terminal,and the like) is not illustrated. For example, a structure exemplifiedin Embodiment 1 can be applied to the light-emitting element 210.

An example of a method of manufacturing the light-emitting element 210is described. For example, over the first substrate using non-alkaliglass, a reflective, electrically conductive film in which a Ti thinfilm is stacked over a Ni—Al—La alloy is formed using a sputteringmethod, and through a photolithography process, an island-shapedelectrically conductive film, a first terminal electrically connectedthereto, and a second terminal to which a second electrode is to beelectrically connected later are formed. Next, an insulating partitionhaving an opening is formed over the island-shaped electricallyconductive film. A portion of the electrically conductive film which canbe seen through the opening serves as the first electrode.

Next, the layer including an organic compound having a light-emittingproperty is formed to cover the first electrode. The second electrode isformed so that the layer including an organic compound having alight-emitting property can be formed between the second electrode andthe first electrode. Note that the second electrode is electricallyconnected to the second terminal.

Second Step

Next, the frame 232 which is to surround the light-emitting element 210and the sealing material 231 which is to surround the frame 232 areformed over the second substrate 202 (see FIG. 5B). Note that there isno particular limitation on the order of forming the frame 232 and thesealing material 231.

The frame 232 can be formed in such a way that a photoresist, an acrylicresin, a polyimide, or the like is processed using a photolithographyprocess, for example. Alternatively, an inkjet method or a dispensingmethod can be used for the formation.

In formation of the sealing material 231, a method suitable for itsmaterial is selected. For example, when a curable resin (such as anepoxy resin or a silicone resin) is used, a dispensing method or thelike is used to form the sealing material 231, or when glass frit isused, prebaking follows application of a liquid in which glass frit isdispersed using a dispensing method or the like to form the sealingmaterial 231.

Third Step

Next, a viscous material is dripped into the region surrounded by theframe 232 over the second substrate. The viscous material includes thedrying agent that reacts with or adsorbs an impurity. Since the viscousmaterial is the non-solid material having viscosity, it spreads in theregion surrounded by the frame 232 (see FIG. 5C). For a method ofdripping the viscous material, for example, a manufacturing apparatusemploying a one drop fill (ODF) method, which is used for manufacture ofa liquid crystal display device, can be used. When the viscous materialis dripped with a manufacturing apparatus employing an ODF method,manufacturing time can be shortened in the manufacture of a displaydevice with a short distance between the first substrate and the secondsubstrate or a large display device. Alternatively, a potting device canbe used.

Fourth Step

Next, the first substrate 201 and the second substrate 202 are bondedusing the sealing material 231 so that the light-emitting element 210,the viscous material layer 220, and the frame 232 can be sealed in aspace surrounded by the sealing material 231.

In order that the amount of the viscous material layer 220 sealed in aspace enclosed by the first substrate 201, the second substrate 202, andthe frame 232 can be adjusted, the amount of the viscous material whichis to be dripped is changed. Alternatively, in the case where not onlythe viscous material but also a gas with fewer impurities (e.g., drynitrogen or an inert gas such as an argon gas) is sealed, thecomposition and pressure of the gas which fills the environment wherethe first substrate 201 and the second substrate 202 are bonded, as wellas the amount of the viscous material, are adjusted.

For example, the viscous material having the same volume as the spaceenclosed by the first substrate 201, the second substrate 202, and theframe 232 is dripped in a reduced pressure environment, so that thespace can be filled with the viscous material layer 220. Further, in thecase where the amount of the viscous material to be dripped is reduced,a reduced pressure space, as well as the viscous material layer 220, canbe provided in the space.

In the case where the viscous material having a smaller volume than thespace enclosed by the first substrate 201, the second substrate 202, andthe sealing material 231 is dripped into the region enclosed by thefirst substrate 201 and the frame 232 in a gas with fewer impurities,the gas with fewer impurities, as well as the viscous material layer220, can be sealed into the space.

The space which is not sealed with the viscous material and which has areduced pressure or is filled with the gas can compensate for a changein the volume of the viscous material layer which is due to heatgeneration in the light-emitting module or can reduce a stress due tothe volume change. Accordingly, it is possible to prevent the phenomenonin which the viscous material layer expands with heat to break thesealing structure (e.g., the bond structure of the sealing material) ofthe light-emitting module.

As a method of bonding the first substrate 201 and the second substrate202, a method suitable for the material used for the sealing material231 is selected. For example, with the use of a curable resin (such asan epoxy resin or a silicone resin), the sealing material 231 can becured in such a way that ultraviolet rays are applied when the resin isan ultraviolet curable resin or that heat is applied when the resin is athermosetting resin. Further, with the use of glass frit, for example,the first substrate 201 and the second substrate 202 can be welded withthe sealing material 231 by irradiation with laser light having awavelength which can be absorbed by the glass frit.

Modification Example

As a modification example of the method of manufacturing alight-emitting module exemplified in this embodiment, the followingmethod is described: a method of manufacturing a light-emitting moduleincluding a first step of forming a light-emitting element and a frameto surround the light-emitting element over a first substrate, a secondstep of forming a sealing material to surround the frame over a secondsubstrate, a third step of dripping a non-solid material havingviscosity which includes a drying agent that reacts with or adsorbs animpurity into a region surrounded by the frame, and a fourth step ofbonding the first substrate and the second substrate using the sealingmaterial, whereby the light-emitting element, the non-solid material,and the frame are sealed inside.

In this manufacturing method, the first electrode of the light-emittingelement and the frame are formed over the first substrate. Hence, thesecan be sequentially formed using the same processing method (e.g., aphotolithography method), and consequently the manufacturing process canbe simplified.

In the above method of manufacturing a light-emitting module of oneembodiment of the present invention, subsequent to the step of drippinga non-solid material having viscosity which includes a drying agent thatreacts with or adsorbs an impurity into a region surrounded by theframe, the first substrate and the second substrate are bonded with thesealing material so that the light-emitting element, the frame, and thenon-solid material can be sealed inside.

Accordingly, the viscous material layer including the non-solid materialcan be efficiently formed between the first substrate and the secondsubstrate which are large substrates.

Accordingly, a highly reliable light-emitting module including anorganic EL element can be manufactured. Further, a light-emitting modulewhich is unlikely to cause a defect in light emission can bemanufactured.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 5

In this embodiment, a method of manufacturing a light-emitting device ofone embodiment of the present invention is described. Specifically, amanufacturing method in which, subsequent to the step of dripping anon-solid material having viscosity which includes a drying agent thatreacts with or adsorbs an impurity into a region surrounded by a frame,a first substrate and a second substrate are bonded with a sealingmaterial so that transistors, light-emitting elements, the frame, andthe non-solid material can be sealed inside is described using FIGS. 6Ato 6D.

First Step

First, a pixel portion 310 including the light-emitting elements and atransistor and a driver circuit 315 including a transistor are formedover a first substrate 301 (see FIG. 6A). Note that the detailedstructures of the pixel portion 310 and the driver circuit 315 are notillustrated in FIGS. 6A to 6D.

A structure exemplified in Embodiment 1 can be applied to thelight-emitting elements provided in the pixel portion 310. Transistorsthat can be formed in the same step can be used for the pixel portion310 and the driver circuit 315. For example, a transistor exemplified inEmbodiment 7 can be used.

An example of a method of fabricating the pixel portion 310 isdescribed. For example, the transistors are formed over a surface of thefirst substrate 301 using non-alkali glass in accordance with the methodexemplified in Embodiment 7. Further, a wiring, a capacitor, and thelike are formed in addition to the transistors, and thus the pixelportion and the driver circuit portion are fabricated.

Next, the first electrode which is electrically connected to the sourceelectrode or drain electrode of the transistor is formed. As the firstelectrode, for example, a reflective, electrically conductive film inwhich a Ti thin film is stacked over a Ni—Al—La alloy is formed using asputtering method, and an island-shaped electrically conductive film isformed for each pixel through a photolithography process. Next, aninsulating partition having an opening overlapping with eachisland-shaped electrically conductive film is formed. A portion of theelectrically conductive film which is seen through the opening serves asthe first electrode for the plurality of light-emitting elements.

Next, the layer including an organic compound having a light-emittingproperty is formed to cover the first electrode. The second electrode isformed so that the layer including an organic compound having alight-emitting property can be formed between the second electrode andthe first electrode.

Second Step

Next, a frame 332 which is to surround the pixel portion 310 and thesealing material 331 which is to surround the frame 332 are formed overa second substrate 302 (see FIG. 6B). Note that there is no particularlimitation on the order of forming the frame 332 and the sealingmaterial 331.

The frame 332 can be formed in such a way that a photoresist, an acrylicresin, a polyimide, or the like is processed using a photolithographyprocess, for example. Alternatively, an inkjet method or a dispensingmethod can be used for the formation. Note that the frame 332exemplified in this embodiment includes a narrow portion and is providedso that a portion where a first space overlapping with the pixel portion310 is formed and a portion where a second space overlapping with thedriver circuit 315 is faulted can be formed.

In formation of the sealing material 331, a method suitable for itsmaterial is selected. For example, when a curable resin (such as anepoxy resin or a silicone resin) is used, a dispensing method or thelike is used to form the sealing material 331, or when glass frit isused, prebaking follows application of a liquid in which glass frit isdispersed using a dispensing method or the like to form the sealingmaterial 331.

Third Step

Next, a viscous material is dripped into the region surrounded by theframe 332 over the second substrate. The viscous material includes thedrying agent that reacts with or adsorbs an impurity. Since the viscousmaterial is the non-solid material having viscosity, it spreads in theregion surrounded by the frame 332 (see FIG. 6C). Note that when thesecond space connected to the first space through the narrow portion isprovided, the viscous material is dripped into the space where the firstspace is formed. Dripping the viscous material into the space where thefirst space is formed enables the viscous material to fill the firstspace before the second space.

Fourth Step

Next, the first substrate 301 and the second substrate 302 are bondedusing the sealing material 331 so that the pixel portion 310, theviscous material layer 320, and the frame 332 can be sealed in a spacesurrounded by the sealing material 331.

In order that the amount of the viscous material layer 320 sealed in aspace enclosed by the first substrate 301, the second substrate 302, andthe frame 332 can be adjusted, the amount of the viscous material whichis to be dripped is changed. Alternatively, in the case where not onlythe viscous material but also a gas with fewer impurities (e.g., drynitrogen or an inert gas such as an argon gas) is sealed, thecomposition and pressure of the gas which fills the environment wherethe first substrate 301 and the second substrate 302 are bonded, as wellas the amount of the viscous material, are adjusted.

For example, the viscous material having the same volume as the spaceenclosed by the first substrate 301, the second substrate 302, and theframe 332 is dripped in a reduced pressure environment, so that thespace can be filled with the viscous material layer 320. Further, in thecase where the amount of the viscous material to be dripped is reduced,a reduced pressure space, as well as the viscous material layer 320, canbe provided in the space.

In the case where the viscous material having a smaller volume than thespace enclosed by the first substrate 301, the second substrate 302, andthe frame 332 is dripped into the region enclosed by the first substrate301 and the frame 332 in a gas with fewer impurities, the gas with fewerimpurities, as well as the viscous material layer 320, can be sealedinto the space.

The space which is not sealed with the viscous material and which has areduced pressure or is filled with the gas can compensate for a changein the volume of the viscous material layer which is due to heatgeneration in the light-emitting device or can reduce a stress due tothe volume change. Accordingly, it is possible to prevent the phenomenonin which the viscous material layer expands with heat to break thesealing structure (e.g., the bond structure of the sealing material) ofthe light-emitting module.

As a method of bonding the first substrate 301 and the second substrate302, a method suitable for the material used for the sealing material331 is selected. For example, with the use of a curable resin (such asan epoxy resin or a silicone resin), the sealing material 331 can becured in such a way that ultraviolet rays are applied when the resin isan ultraviolet curable resin or that heat is applied when the resin is athermosetting resin. Further, with the use of glass frit, for example,the first substrate 301 and the second substrate 302 can be welded withthe sealing material 331 by irradiation with laser light having awavelength which can be absorbed by the glass fit.

Note that a multicolor light-emitting device can be formed with pixelsexhibiting white light, which are formed in the pixel portion over thefirst substrate 301, and color filters corresponding to the pixels,which are formed over the second substrate 302.

Modification Example

As a modification example of the method of manufacturing alight-emitting device exemplified in this embodiment, the followingmethod is described: a method of manufacturing a light-emitting deviceincluding a first step of forming a pixel portion and a frame tosurround the pixel portion over a first substrate, a second step offorming a sealing material to surround the frame over a secondsubstrate, a third step of dripping a non-solid material havingviscosity which includes a drying agent that reacts with or adsorbs animpurity into a region surrounded by the frame, and a fourth step ofbonding the first substrate and the second substrate using the sealingmaterial, whereby the transistor, the light-emitting element, thenon-solid material, and the frame are sealed inside.

In this manufacturing method, the pixel portion and the frame are formedover the first substrate. Hence, these can be sequentially formed usingthe same processing method (e.g., a photolithography method), andconsequently the manufacturing process can be simplified.

In the above method of manufacturing a light-emitting device of oneembodiment of the present invention, subsequent to the step of drippinga non-solid material having viscosity which includes a drying agent thatreacts with or adsorbs an impurity into a region surrounded by theframe, the first substrate and the second substrate are bonded with thesealing material so that the light-emitting element, the frame, and thenon-solid material can be sealed inside.

Accordingly, the viscous material layer including the non-solid materialcan be efficiently formed between the first substrate and the secondsubstrate which are large substrates.

A highly reliable light-emitting device including an organic EL elementcan be manufactured. Further, a light-emitting device which is unlikelyto cause a defect in light emission can be manufactured.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 6

In this embodiment, a structure of a light-emitting element which can beused for the light-emitting module or light-emitting device of oneembodiment of the present invention is described. Specifically, anexample of a light-emitting element in which a layer including anorganic compound having a light-emitting property is interposed betweena pair of electrodes is described with reference to FIGS. 7A to 7E.

The light-emitting element exemplified in this embodiment includes afirst electrode, a second electrode, and a layer including an organiccompound having a light-emitting property (hereinafter referred to as ELlayer) provided between the first and second electrodes. One of thefirst electrode and the second electrode functions as an anode, and theother functions as a cathode. The EL layer is provided between the firstelectrode and the second electrode, and the structure of the EL layermay be appropriately selected in accordance with materials of the firstelectrode and the second electrode. An example of the structure of thelight-emitting element is described below; however, it is needless tosay that the structure of the light-emitting element is not limited tothe example.

Structure Example 1 of Light-Emitting Element

An example of the structure of the light-emitting element is illustratedin FIG. 7A. In the light-emitting element illustrated in FIG. 7A, an ELlayer is provided between an anode 1101 and a cathode 1102.

When a voltage higher than the threshold voltage of the light-emittingelement is applied between the anode 1101 and the cathode 1102, holesare injected into the EL layer from the anode 1101 side and electronsare injected into the EL layer from the cathode 1102 side. The injectedelectrons and holes recombine in the EL layer, so that a light-emittingsubstance contained in the EL layer emits light.

In this specification, a layer or a stacked body which includes oneregion where electrons and holes injected from both ends recombine isreferred to as light-emitting unit. Therefore, it can be said thatStructure example 1 of the light-emitting element includes onelight-emitting unit.

A light-emitting unit 1103 may include at least one light-emitting layerincluding a light-emitting substance, and may have a structure in whichthe light-emitting layer and a layer other than the light-emitting layerare stacked. Examples of the layer other than the light-emitting layerare layers containing a substance having a high hole-injection property,a substance having a high hole-transport property, a substance having apoor hole-transport property (a substance which blocks holes), asubstance having a high electron-transport property, a substance havinga high electron-injection property, and a substance having a bipolarproperty (a substance having high electron- and hole-transportproperties).

An example of a specific structure of the light-emitting unit 1103 isillustrated in FIG. 7B. In the light-emitting unit 1103 illustrated inFIG. 7B, a hole-injection layer 1113, a hole-transport layer 1114, alight-emitting layer 1115, an electron-transport layer 1116, and anelectron-injection layer 1117 are stacked in that order from the anode1101 side.

Structure Example 2 of Light-Emitting Element

Another example of the structure of the light-emitting element isillustrated in FIG. 7C. In the light-emitting element illustrated inFIG. 7C, an EL layer including the light-emitting unit 1103 is providedbetween the anode 1101 and the cathode 1102. Further, an intermediatelayer 1104 is provided between the cathode 1102 and the light-emittingunit 1103. Note that a structure similar to that of the light-emittingunit included in Structure example 1 of the light-emitting element,which is described above, can be applied to the light-emitting unit 1103in Structure example 2 of the light-emitting element and that thedescription of Structure example 1 of the light-emitting element can bereferred to for the details.

The intermediate layer 1104 may be formed to include at least a chargegeneration region, and may have a structure in which the chargegeneration region and a layer other than the charge generation regionare stacked. For example, a structure can be employed in which a firstcharge generation region 1104 c, an electron-relay layer 1104 b, and anelectron-injection buffer 1104 a are stacked in that order from thecathode 1102 side.

The behaviors of electrons and holes in the intermediate layer 1104 aredescribed. When a voltage higher than the threshold voltage of thelight-emitting element is applied between the anode 1101 and the cathode1102, in the first charge generation region 1104 c, holes and electronsare generated, and the holes are transferred to the cathode 1102 and theelectrons are transferred to the electron-relay layer 1104 b. Theelectron-relay layer 1104 b has a high electron-transport property andimmediately transfers the electrons generated in the first chargegeneration region 1104 c to the electron-injection buffer 1104 a. Theelectron-injection buffer 1104 a can reduce a barrier against electroninjection into the light-emitting unit 1103, so that the efficiency ofthe electron injection into the light-emitting unit 1103 can beimproved. Thus, the electrons generated in the first charge generationregion 1104 c are injected into the LUMO level of the light-emittingunit 1103 through the electron-relay layer 1104 b and theelectron-injection buffer 1104 a.

In addition, the electron-relay layer 1104 b can prevent interaction inwhich, for example, a substance included in the first charge generationregion 1104 c and a substance included in the electron-injection buffer1104 a react with each other at the interface thereof to impair thefunctions of the first charge generation region 1104 c and theelectron-injection buffer 1104 a.

The range of choices of materials that can be used for the cathode inStructure example 2 of the light-emitting element is wider than that ofmaterials that can be used for the cathode in Structure example 1. Thisis because the cathode in Structure example 2 may receive holesgenerated by the intermediate layer and a material having a relativelyhigh work function can be used.

Structure Example 3 of Light-Emitting Element

Another example of the structure of the light-emitting element isillustrated in FIG. 7D. In the light-emitting element illustrated inFIG. 7D, an EL layer including two light-emitting units is providedbetween the anode 1101 and the cathode 1102. Furthermore, theintermediate layer 1104 is provided between a first light-emitting unit1103 a and a second light-emitting unit 1103 b.

Note that the number of the light-emitting units provided between theanode and the cathode is not limited to two. A light-emitting elementillustrated in FIG. 7E has a structure in which a plurality oflight-emitting units 1103 is stacked, that is, a so-called tandemstructure. Note that in the case where n (n is a natural number greaterthan or equal to 2) light-emitting units 1103 are provided between theanode and the cathode, for example, the intermediate layer 1104 isprovided between an m-th (in is a natural number greater than or equalto 1 and less than or equal to n−1) light-emitting unit and an (m+1)-thlight-emitting unit.

Note that a structure similar to that in Structure example 1 of thelight-emitting element can be applied to the light-emitting unit 1103 inStructure example 3 of the light-emitting element; a structure similarto that in Structure example 2 of the light-emitting element can beapplied to the intermediate layer 1104 in Structure example 3 of thelight-emitting element. Thus, for the details, the description of theStructure example 1 of the light-emitting element or the Structureexample 2 of the light-emitting element can be referred to.

The behavior of electrons and holes in the intermediate layer 1104provided between the light-emitting units is described. When a voltagehigher than the threshold voltage of the light-emitting element isapplied between the anode 1101 and the cathode 1102, holes and electronsare generated in the intermediate layer 1104, and the holes aretransferred to the light-emitting unit provided on the cathode 1102 sideand the electrons are transferred to the light-emitting unit provided onthe anode side. The holes injected into the light-emitting unit providedon the cathode side recombine with the electrons injected from thecathode side, so that a light-emitting substance contained in thelight-emitting unit emits light. The electrons injected into thelight-emitting unit provided on the anode side recombine with the holesinjected from the anode side, so that a light-emitting substancecontained in the light-emitting unit emits light. Thus, the holes andelectrons generated in the intermediate layer 1104 cause light emissionin the respective light-emitting units.

Note that in the case where a structure which is the same as theintermediate layer is formed between the light-emitting units byproviding the light-emitting units in contact with each other, thelight-emitting units can be formed to be in contact with each other.Specifically, when one surface of the light-emitting unit is providedwith a charge generation region, the charge generation region functionsas a first charge generation region of the intermediate layer; thus, thelight-emitting units can be provided in contact with each other.

The Structure examples 1 to 3 of the light-emitting element can beimplemented in combination. For example, an intermediate layer can beprovided between the cathode and a light-emitting unit in Structureexample 3 of the light-emitting element.

Materials which can be Used for Light-Emitting Element

Next, specific materials that can be used for the light-emitting elementhaving the above-described structure are described. Materials for theanode, the cathode, and the EL layer are described in that order.

Materials which can be Used for Anode

The anode 1101 is preferably formed using a metal, an alloy, anelectrically conductive compound, a mixture of these materials, or thelike which has a high work function (specifically, a work functionhigher than or equal to 4.0 eV is preferable). Specific examples areindium tin oxide (ITO), indium tin oxide containing silicon or siliconoxide, indium zinc oxide (IZO), indium oxide containing tungsten oxideand zinc oxide, and the like.

Such electrically conductive metal oxide films are usually formed by asputtering method, but may also be formed by application of a sol-gelmethod or the like. For example, an indium-zinc oxide film can be formedby a sputtering method using a target in which zinc oxide is added atgreater than or equal to 1 wt % and less than or equal to 20 wt % toindium oxide. A film of indium oxide containing tungsten oxide and zincoxide can be formed by a sputtering method using a target in whichtungsten oxide and zinc oxide are added at greater than or equal to 0.5wt % and less than or equal to 5 wt % and greater than or equal to 0.1wt % and less than or equal to 1 wt %, respectively, to indium oxide.

Besides, the following can be given: gold (Au), platinum (Pt), nickel(Ni), tungsten (W), chromium (Cr), molybdenum (Mo), iron (Fe), cobalt(Co), copper (Cu), palladium (Pd), titanium (Ti), nitride of a metalmaterial (e.g., titanium nitride), molybdenum oxide, vanadium oxide,ruthenium oxide, tungsten oxide, manganese oxide, titanium oxide, andthe like. Alternatively, an electrically conductive polymer such aspoly(3,4-ethylenedioxythiophene)/poly(styrenesulfonic acid) (PEDOT/PSS)or polyaniline/poly(styrenesulfonic acid) (PAni/PSS) may be used.

Note that in the case where a second charge generation region isprovided in contact with the anode 1101, a variety of electricallyconductive materials can be used for the anode 1101 regardless of theirwork functions. Specifically, besides a material which has a high workfunction, a material which has a low work function can also be used. Amaterial for forming the second charge generation region is describedlater together with a material for forming the first charge generationregion.

Materials which can be Used for Cathode

In the case where the first charge generation region 1104 c is providedbetween the cathode 1102 and the light-emitting unit 1103 to be incontact with the cathode 1102, a variety of electrically conductivematerials can be used for the cathode 1102 regardless of their workfunctions.

Note that at least one of the cathode 1102 and the anode 1101 is formedusing an electrically conductive film that transmits visible light. Foran electrically conductive film that transmits visible light, forexample, indium oxide containing tungsten oxide, indium zinc oxidecontaining tungsten oxide, indium oxide containing titanium oxide,indium tin oxide containing titanium oxide, indium tin oxide(abbreviation: ITO), indium zinc oxide, and indium tin oxide to whichsilicon oxide is added can be given. Further, a metal thin film having athickness enough to transmit light (preferably, approximately greaterthan or equal to 5 nm and less than or equal to 30 nm) can also be used.

Materials which can be Used for EL Layer

Specific examples of materials for the above-described layers includedin the light-emitting unit 1103 are given below.

The hole-injection layer is a layer containing a substance having a highhole-injection property. As the substance having a high hole-injectionproperty, for example, molybdenum oxide, vanadium oxide, rutheniumoxide, tungsten oxide, manganese oxide, or the like can be used. Inaddition, it is possible to use a phthalocyanine-based compound such asphthalocyanine (abbreviation: H₂Pc) or copper phthalocyanine(abbreviation: CuPc), a high molecule such aspoly(3,4-ethylenedioxythiophene)/poly(styrenesulfonic acid) (PEDOT/PSS),or the like to form the hole-injection layer.

Note that the hole-injection layer may be formed using the second chargegeneration region. When the second charge generation region is used forthe hole-injection layer, a variety of electrically conductive materialscan be used for the anode 1101 regardless of their work functions asdescribed above. A material for forming the second charge generationregion is described later together with a material for forming the firstcharge generation region.

Hole-Transport Layer

The hole-transport layer is a layer containing a substance having a highhole-transport property. The hole-transport layer is not limited to asingle layer, and may be a stack of two or more layers each containing asubstance having a high hole-transport property. The hole-transportlayer contains a substance having a higher hole-transport property thanan electron-transport property, and preferably contains a substancehaving a hole mobility higher than or equal to 10⁻⁶ cm²/V·s because thedriving voltage of the light-emitting element can be reduced.

Examples of the substance having a high hole-transport property are anaromatic amine compound such as4,4′-bis[N-(1-naphthyl)-N-phenylamino]biphenyl (abbreviation: NPB ora-NPD), and a carbazole derivative such as3-[N-(9-phenylcarbazol-3-yl)-N-phenylamino]-9-phenylcarbazole(abbreviation: PCzPCA1).

In addition to the above substances, a high molecular compound such aspoly(N-vinylcarbazole) (abbreviation: PVK) can be used for thehole-transport layer.

Light-Emitting Layer

The light-emitting layer contains a light-emitting substance. Thelight-emitting layer is not limited to a single layer, and may be astack of two or more layers containing light-emitting substances. As thelight-emitting substance, a fluorescent compound or a phosphorescentcompound can be used. A phosphorescent compound is preferably used asthe light-emitting substance because the emission efficiency of thelight-emitting element can be increased.

Examples of a fluorescent compound that can be used as thelight-emitting substance areN,N′-bis[4-(9H-carbazol-9-yl)phenyl]-N,N′-diphenylstilbene-4,4′-diamine(abbreviation: YGA2S) and the like.

Examples of the phosphorescent compound that can be used as thelight-emitting substance arebis[2-(4′,6′-difluorophenyl)pyridinato-N,C^(2′)]iridium(III)tetrakis(1-pyrazolyl)borate (abbreviation: FIr6) and the like.

The light-emitting substance is preferably dispersed in a host material.A host material preferably has higher excitation energy than thelight-emitting substance.

As a material which can be used as the host material, it is possible touse an aromatic amine compound such as NPB, or a carbazole derivativesuch as CzPCA1. Alternatively, it is possible to use a substance whichhas a high hole-transport property and contains a high molecularcompound, such as PVK, PVTPA, PTPDMA, or Poly-TPD. Alternatively, it ispossible to use a metal complex having a quinoline skeleton or abenzoquinoline skeleton, such as tris(8-quinolinolato)aluminum(abbreviation: Alq). Alternatively, it is possible to use a metalcomplex having an oxazole-based or thiazole-based ligand, such asbis[2-(2-hydroxyphenyl)benzoxazolato]zinc (abbreviation: Zn(BOX)₂).Further alternatively, it is possible to use a substance having a highelectron-transport property, such as2-(4-biphenylyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole (abbreviation:PBD),

Electron-Transport Layer

The electron-transport layer is a layer that contains a substance havinga high electron-transport property. The electron-transport layer is notlimited to a single layer, and may be a stack of two or more layers eachcontaining a substance having a high electron-transport property. Theelectron-transport layer contains a substance having a higherelectron-transport property than a hole-transport property, andpreferably contains a substance having an electron mobility higher thanor equal to 10⁻⁶ cm²/V·s because the driving voltage of thelight-emitting element can be reduced.

As the substance having a high electron-transport property, for example,a metal complex having a quinoline skeleton or a benzoquinolineskeleton, such as Alq, or the like can be used. Alternatively, a metalcomplex having an oxazole-based or thiazole-based ligand, such asZn(BOX)₂ or Zn(BTZ)₂, or the like can be used. Further alternatively,PBD or the like can be used.

Besides the above-described substances, a high molecular compound suchas poly[(9,9-dihexylfluorene-2,7-diyl)-co-(pyridine-3,5-diyl)](abbreviation: PF-Py) can be used for the electron-transport layer.

Electron-Injection Layer

The electron-injection layer is a layer that contains a substance havinga high electron-injection property. The electron-injection layer is notlimited to a single layer, and may be a stack of two or more layerscontaining substances having a high electron-injection property. Theelectron-injection layer is preferably provided because the efficiencyof electron injection from the cathode 1102 can be increased and thedriving voltage of the light-emitting element can be reduced.

Examples of the substance having a high electron-injection property arealkali metals such as lithium (Li), alkaline earth metals, and compoundsthereof. Alternatively, a layer in which an alkali metal, an alkalineearth metal, magnesium (Mg), or a compound of them is contained in asubstance having an electron-transport property, such as a layer inwhich magnesium (Mg)) is contained in Alq, can be used.

Materials which can be Used for Charge Generation Region

The first charge generation region 1104 c and the second chargegeneration region are regions containing a substance having a highhole-transport property and an acceptor substance. The charge generationregion may not only include a substance having a high hole-transportproperty and an acceptor substance in the same film but may include astack of a layer containing a substance having a high hole-transportproperty and a layer containing an acceptor substance. Note that in thecase where the first charge generation region provided on the cathodeside has a layered structure, the layer containing the substance havinga high hole-transport property is in contact with the cathode 1102. Inthe case where the second charge generation region provided on the anodeside has a layered structure, the layer containing the acceptorsubstance is in contact with the anode 1101.

Note that the acceptor substance is preferably added to the chargegeneration region so that the mass ratio of the acceptor substance tothe substance having a high hole-transport property is greater than orequal to 0.1 and less than or equal to 4.0.

Examples of the acceptor substance that is used for the chargegeneration region are a transition metal oxide and an oxide of a metalbelonging to Group 4 to Group 8 of the periodic table. Specifically,molybdenum oxide is particularly preferable. Note that molybdenum oxidehas a low hygroscopic property.

As the substance having a high hole-transport property used for thecharge generation region, any of a variety of organic compounds such asan aromatic amine compound, a carbazole derivative, an aromatichydrocarbon, and a high molecular compound (e.g., an oligomer, adendrimer, or a polymer) can be used. Specifically, a substance having ahole mobility higher than or equal to 10⁻⁶ cm²/Vs is preferably used.Note that other than the above substances, any substance that has aproperty of transporting more holes than electrons may be used.

Materials which can be Used for Electron-Relay Layer

The electron-relay layer 1104 b is a layer that can immediately receiveelectrons drawn out by the acceptor substance in the first chargegeneration region 1104 c. Therefore, the electron-relay layer 1104 b isa layer containing a substance having a high electron-transportproperty. Its LUMO level is positioned between the acceptor level of theacceptor substance in the first charge generation region 1104 c and theLUMO level of the light-emitting unit 1103 in contact with theelectron-relay layer. Specifically, the LUMO level of the electron-relaylayer 1104 b is preferably higher than or equal to −5.0 eV and lowerthan or equal to −3.0 eV.

As the substance used for the electron-relay layer 1104 b, for example,a perylene derivative and a nitrogen-containing condensed aromaticcompound can be given. Note that a nitrogen-containing condensedaromatic compound is preferably used for the electron-relay layer 1104 bbecause of its stability. Among nitrogen-containing condensed aromaticcompounds, a compound having an electron-withdrawing group such as acyano group or a fluoro group is preferably used because such a compoundfurther facilitates acceptance of electrons in the electron-relay layer1104 b.

Specific examples of the perylene derivative are3,4,9,10-perylenetetracarboxylic dianhydride (abbreviation: PTCDA) andthe like.

Specific examples of the nitrogen-containing condensed aromatic compoundare pirazino[2,3-f][1,10]phenanthroline-2,3-dicarbonitrile(abbreviation: PPDN) and the like.

Materials which can be Used Electron-Injection Buffer

The electron-injection buffer 1104 a is a layer which facilitateselectron injection from the first charge generation region 1104 c intothe light-emitting unit 1103. By providing the electron-injection buffer1104 a between the first charge generation region 1104 c and thelight-emitting unit 1103, the injection barrier therebetween can bereduced.

A substance having a high electron-injection property can be used forthe electron-injection buffer 1104 a. For example, an alkali metal, analkaline earth metal, a rare earth metal, or a compound thereof (e.g.,an alkali metal compound (including an oxide such as lithium oxide, ahalide, and a carbonate such as lithium carbonate or cesium carbonate),an alkaline earth metal compound (including an oxide, a halide, and acarbonate), or a rare earth metal compound (including an oxide, ahalide, and a carbonate)) can be used.

Further, in the case where the electron-injection buffer 1104 a containsa substance having a high electron-transport property and a donorsubstance, the donor substance is preferably added so that the massratio of the donor substance to the substance having a highelectron-transport property is greater than or equal to 0.001 and lessthan or equal to 0.1. Note that as the donor substance, an organiccompound such as tetrathianaphthacene (abbreviation: TTN), nickelocene,or decamethylnickelocene can be used as well as an alkali metal, analkaline earth metal, a rare earth metal, and a compound of the abovemetal (e.g., an alkali metal compound (including an oxide of lithiumoxide or the like, a halide, and a carbonate such as lithium carbonateor cesium carbonate), an alkaline earth metal compound (including anoxide, a halide, and a carbonate), and a rare earth metal compound(including an oxide, a halide, and a carbonate). Note that as thesubstance having a high electron-transport property, a material similarto the above material for the electron-transport layer which can beformed in part of the light-emitting unit 1103 can be used.

Method of Manufacturing Light-Emitting Element

One mode of a method of manufacturing a light-emitting element isdescribed. Over the first electrode, the layers described above arecombined as appropriate to form an EL layer. Any of a variety of methods(e.g., a dry process or a wet process) can be used to form the EL layerdepending on the material for the EL layer. For example, a vacuumevaporation method, an inkjet method, a spin coating method, or the likemay be selected. Note that a different formation method may be employedfor each layer. The second electrode is formed over the EL layer. In theabove manner, the light-emitting element is manufactured.

The light-emitting element described in this embodiment can bemanufactured by combination of the above-described materials. With thislight-emitting element, light emission from the above-describedlight-emitting substance can be obtained. The emission color can beselected by changing the type of the light-emitting substance.

Further, a plurality of light-emitting substances which emit light ofdifferent colors can be used, whereby, for example, white light emissioncan also be obtained by expanding the width of the emission spectrum.Note that in order to obtain white light emission, for example, astructure may be employed in which at least two layers containinglight-emitting substances are provided so that light of complementarycolors is emitted. Specific examples of complementary colors are “blueand yellow”, “blue-green and red”, and the like.

Further, in order to obtain white light emission with an excellent colorrendering property, an emission spectrum preferably spreads through theentire visible light region. For example, a light-emitting element mayinclude layers emitting light of blue, green, and red.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 7

In this embodiment, the structure of a transistor that can be used in alight-emitting device of one embodiment of the present invention isdescribed. Note that a method of forming a transistor illustrated inthis embodiment is described in Embodiment 8.

The structure of the transistor illustrated in this embodiment isdescribed with reference to FIG. 8D. FIG. 8D illustrates a cross sectionof the transistor.

A transistor 710 illustrated in this embodiment includes, over asubstrate 701, an insulating layer 704 serving as a base, a gateelectrode 711, a gate insulating layer 712, an oxide semiconductor layer713, electrodes 751 and 752 functioning as a source and drainelectrodes, and an insulating layer 705 for protecting the transistor.

Structure of Insulating Layer Serving as Base

The insulating layer 704 serves as a base of the transistor 710.

The insulating layer 704 serving as a base may have either asingle-layer structure of a layer including one or more materialsselected from silicon oxide, silicon nitride, silicon oxynitride,silicon nitride oxide, aluminum oxide, aluminum nitride, aluminumoxynitride, aluminum nitride oxide, hafnium oxide, gallium oxide, andthe like or a layered structure of two or more layers including one ormore such materials, for example.

Gate Electrode

The gate electrode 711 overlaps with the oxide semiconductor layer 713with the gate insulating layer 712 provided therebetween, and functionsas a gate electrode of the transistor 710.

The gate electrode 711 may have either a single-layer structure of alayer containing an electrically conductive material or a layeredstructure of two or more layers each containing an electricallyconductive material.

As the electrically conductive material, any electrically conductivematerial may be used as long as it has electrical conductivity and canwithstand the heat treatment process. For example, a metal selected frommolybdenum, titanium, tantalum, tungsten, aluminum, copper, neodymium,scandium, and the like, or an alloy containing the metal can be used.

Alternatively, a semiconductor layer typified by a polycrystallinesilicon film doped with an impurity element such as phosphorus, or asilicide layer such as a nickel silicide layer may be used.

Gate Insulating Layer

The gate insulating layer 712 can be formed using silicon oxide, siliconnitride, silicon oxynitride, silicon nitride oxide, gallium oxide,aluminum oxide, aluminum oxynitride, tantalum oxide, or the like.

The gate insulating layer 712 can be formed using a high dielectricconstant (high-k) material. Examples of a high dielectric constantmaterial are hafnium oxide, yttrium oxide, lanthanum oxide, hafniumsilicate (HfSi_(x)O_(y) (x>0, y>0)), hafnium aluminate (HfAl_(x)O_(y)(x>0, y>0)), hafnium silicate to which nitrogen is added(HfSi_(x)O_(y)N_(z) (x>0, y>0, z>0)), hafnium aluminate to whichnitrogen is added (HfAl_(x)O_(y)N_(z) (x>0, y>0, z>0)), and the like.

The gate insulating layer 712 may have either a single-layer structureor a layered structure. For example, the gate insulating layer 712 mayhave a layered structure of a layer containing a high-k material and alayer containing a material selected from silicon oxide, siliconnitride, silicon oxynitride, silicon nitride oxide, aluminum oxide, orthe like.

When the gate insulating layer 712 is made thin or formed using thehigh-k material, the transistor can be reduced in size withoutsacrificing operating characteristics.

For example, in the case where silicon oxide is used, the thickness canbe set to greater than or equal to 1 nm and less than or equal to 100nm, preferably greater than or equal to 10 nm and less than or equal to50 nm.

In the case where a high-k material is used, the transistor can bereduced in size without making the transistor so thin that gate leakagedue to a tunneling effect or the like is generated.

Note that the gate insulating layer 712 can be formed using aninsulating material containing a Group 13 element and oxygen. Note thatan insulating material containing a Group 13 element means an insulatingmaterial containing one or more Group 13 elements.

Examples of the insulating material containing a Group 13 element andoxygen are gallium oxide, aluminum oxide, aluminum gallium oxide, andgallium aluminum oxide. Here, aluminum gallium oxide refers to asubstance in which the aluminum content is higher than the galliumcontent in atomic percent (at.%), and gallium aluminum oxide refers to asubstance in which the gallium content is higher than or equal to thealuminum content in atomic percent (at.%).

Oxide Semiconductor Layer

The oxide semiconductor layer 713 in which a channel is formed overlapswith the gate electrode 711 with the gate insulating layer 712interposed therebetween and is electrically connected to the electrodes751 and 752 between which the gate electrode 711 is provided. Note thatthe electrodes 751 and 752 function as a source and drain electrodes.

The thickness of the oxide semiconductor layer 713 in which a channel isformed is greater than or equal to 2 nm and less than or equal to 200nm, preferably greater than or equal to 5 nm and less than or equal to30 nm.

Note that the oxide semiconductor layer 713 is not necessarily processedinto an island shape.

The oxide semiconductor layer 713 may be either single crystal ornon-single-crystal. In the latter case, the oxide semiconductor layer713 may have an amorphous structure, a crystalline portion, or acrystalline portion in an amorphous structure. The oxide semiconductorlayer 713 may be amorphous, polycrystalline, or non-amorphous.

An example of a crystalline oxide semiconductor layer is an oxidesemiconductor layer having c-axis aligned crystals (CAAC).

The proportion of oxygen in the oxide semiconductor layer 713 ispreferably higher than the stoichiometric proportion. When theproportion of oxygen is higher than the stoichiometric proportion,generation of carriers caused by oxygen vacancies in a metal oxide layercan be inhibited.

The oxide semiconductor layer 713 preferably contains at least indium(In) or zinc (Zn). In particular, the oxide semiconductor layer 713preferably contains In and Zn.

As a stabilizer for reducing variation in electric characteristics oftransistors using an oxide semiconductor, gallium (Ga) is preferablyadditionally contained. Tin (Sn) is preferably contained as astabilizer. Hafnium (Hf) is preferably contained as a stabilizer.Aluminum (Al) is preferably contained as a stabilizer.

As another stabilizer, one or more kinds of lanthanoid such as lanthanum(La), cerium (Ce), praseodymium (Pr), neodymium (Nd), samarium (Sm),europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium(Ho), erbium (Er), thulium (Tm), ytterbium (Yb), or lutetium (Lu) may becontained.

As the oxide semiconductor, for example, any of the following can beused: indium oxide; tin oxide; zinc oxide; a binary metal oxide such asan In—Zn-based oxide, a Sn—Zn-based oxide, an Al—Zn-based oxide, aZn—Mg-based oxide, a Sn—Mg-based oxide, an In—Mg-based oxide, or anIn—Ga-based oxide; a ternary metal oxide such as an In—Ga—Zn-based oxide(also referred to as IGZO), an In—Al—Zn-based oxide, an In—Sn—Zn-basedoxide, a Sn—Ga—Zn-based oxide, an Al—Ga—Zn-based oxide, a Sn—Al—Zn-basedoxide, an In—Hf—Zn-based oxide, an In—La—Zn-based oxide, anIn—Ce—Zn—based oxide, an In—Pr—Zn—based oxide, an In—Nd—Zn—based oxide,an In—Sm—Zn—based oxide, an In—Eu—Zn—based oxide, an In—Gd—Zn—basedoxide, an In—Tb—Zn—based oxide, an In—Dy—Zn—based oxide, anIn—Ho—Zn—based oxide, an In—Er—Zn—based oxide, an In—Tm—Zn—based oxide,an In—Yb—Zn—based oxide, or an In—Lu—Zn—based oxide; or a quaternarymetal oxide such as an In—Sn—Ga—Zn—based oxide, an In—Hf—Ga—Zn—basedoxide, an In—Al—Ga—Zn—based oxide, an In—Sn—Al—Zn—based oxide, anIn—Sn—Hf—Zn—based oxide, or an In—Hf—Al—Zn—based oxide.

Here, for example, an In—Ga—Zn—O-based material means an oxidecontaining indium (In), gallium (Ga), and zinc (Zn). There is noparticular limitation on the composition ratio. Further, theIn—Ga—Zn—O-based material may contain a metal element other than In, Ga,and Zn. For example, the In—Ga—Zn—O-based material may contain SiO₂.

A material represented by InMO₃(ZnO)_(m) (m>0, where m is not aninteger) may be used as the oxide semiconductor. Note that M denotes oneor more metal elements selected from Ga, Fe, Mn, and Co. A materialrepresented by In₂SnO₅(ZnO)_(n) (n>0, where n is an integer) may be usedas the oxide semiconductor.

However, without limitation to the materials given above, a materialwith an appropriate composition may be used depending on neededsemiconductor characteristics (e.g., mobility, threshold voltage, andvariation). In order to obtain needed semiconductor characteristics, itis preferable that carrier concentration, impurity concentration, defectdensity, an atomic ratio between a metal element and oxygen, interatomicdistance, density, and the like be set to appropriate values.

Source Electrode and Drain Electrode

The electrodes 751 and 752 are electrically connected to the oxidesemiconductor layer 713, and function as a source and drain electrodesof the transistor.

The electrode functioning as the source electrode or the drain electrodemay have either a single-layer structure of a layer containing anelectrically conductive material or a layered structure of two or morelayers each containing an electrically conductive material.

Any electrically conductive material may be used as long as it canwithstand heat treatment. For example, a metal selected from aluminum,chromium, copper, titanium, tantalum, molybdenum, and tungsten, or analloy containing the metal can be used. Alternatively, a metal selectedfrom manganese, magnesium, zirconium, beryllium, neodymium, andscandium, or an alloy containing the metal can be used.

A metal nitride can be used as the electrically conductive material.Specific examples of the metal nitride are titanium nitride, molybdenumnitride, and tungsten nitride.

Alternatively, an electrically conductive metal oxide can be used as theelectrically conductive material. Specifically, indium oxide, tin oxide,indium tin oxide (also referred to as ITO) (indium oxide-tin oxide),indium zinc oxide (indium oxide-zinc oxide), zinc oxide, zinc oxide towhich gallium or aluminum is added, or the metal oxide material whichcontains silicon oxide can be used.

Alternatively, graphene or the like can be used as the electricallyconductive material

It is possible to employ, for example, a single-layer structure of atitanium layer or a titanium nitride layer, a single-layer structure ofan aluminum layer containing silicon, a two-layer structure in which atitanium layer is stacked over an aluminum layer, a two-layer structurein which a titanium layer is stacked over a titanium nitride layer, athree-layer structure in which a titanium layer, an aluminum layer, anda titanium layer are stacked, or the like.

Note that the channel length L of the transistor depends on a distancebetween an edge of the source electrode which is in contact with theoxide semiconductor layer and an edge of the drain electrode which is incontact with the oxide semiconductor layer.

Insulating Layer for Protecting Transistor

The insulating layer 705 prevents entry of an impurity such as moisturefrom the outside to protect the transistor.

The thickness of the insulating layer 705 is at least 1 nm or more.

The insulating layer 705 may have either a single-layer structure of alayer including an insulator having a barrier property or a layeredstructure of two or more layers each including an insulator having abarrier property.

In particular, a structure in which aluminum oxide is contained ispreferred. A layered structure of an aluminum oxide layer and a layercontaining another inorganic insulating material may be employed. Thisis because aluminum oxide does not easily transmit moisture, oxygen, andanother impurity.

Alternatively, the insulating layer 705 may have a stack of an oxideinsulating layer having an oxygen excess region and an aluminum oxidelayer. The oxide insulating layer having an oxygen excess region may beprovided closer than the aluminum oxide layer to the oxide semiconductorlayer.

For example, a silicon oxide film, a silicon oxynitride film, or thelike can be used for the oxide insulating layer having an oxygen excessregion.

This embodiment can be implemented in combination with any of the otherembodiments in this specification as appropriate.

Embodiment 8

In this embodiment, a method of manufacturing the transistor 710including an oxide semiconductor layer in a channel formation region,which is described in Embodiment 7, is described with reference to FIGS.8A to 8D.

Formation of Insulating Layer Serving as Base

First, the insulating layer 704 serving as a base of the transistor 710is formed. The insulating layer 704 serving as a base is formed over thesubstrate 701 by a plasma CVD method, a sputtering method, or the like.

The substrate 701 has heat resistance high enough to withstand treatmentperformed after the formation of the insulating layer serving as a base,and is not limited in size.

The substrate 701 may be provided with another semiconductor element inadvance.

As the substrate 701, it is possible to use, for example, a glasssubstrate such as a barium borosilicate glass substrate or analuminoborosilicate glass substrate, a ceramic substrate, a quartzsubstrate, a sapphire substrate, or the like. Alternatively, it ispossible to use a single crystal semiconductor substrate or apolycrystalline semiconductor substrate made of silicon or siliconcarbide, a compound semiconductor substrate made of silicon germanium orthe like, an SOI substrate, or the like.

As the substrate 701, a flexible substrate may be used. A transistor maybe directly formed over a flexible substrate. Alternatively, atransistor may be formed over a manufacturing substrate, and then, thetransistor may be separated from the manufacturing substrate andtransferred to a flexible substrate. Note that in the case where thetransistor is separated from the manufacturing substrate and transferredto the flexible substrate, a separation layer is preferably providedbetween the manufacturing substrate and the transistor including anoxide semiconductor layer.

Formation of Gate Electrode

Then, an electrically conductive layer serving as the gate electrode isformed by a sputtering method or the like.

Next, a resist mask is formed through a photolithography process. Theelectrically conductive layer serving as the gate electrode is etchedusing the resist mask, so that the gate electrode 711 is formed.

Gate Insulating Layer

Next, the gate insulating layer 712 is formed over the gate electrodelayer. An insulating layer serving as the insulating layer over the gateelectrode is formed by a plasma CVD method, a sputtering method, or thelike (see FIG. 8A).

Formation of Oxide Semiconductor Layer

Next, the oxide semiconductor layer 713 where a channel is to be formedis formed over the gate insulating layer 712.

The oxide semiconductor layer can be formed by a sputtering method, amolecular beam epitaxy method, an atomic layer deposition method, or apulsed laser deposition method.

For example, in the case where an In—Ga—Zn—O-based material is used forthe oxide semiconductor, the oxide semiconductor layer can be formedusing a target. A variety of materials and a variety of compositionratios can be used as the material and composition ratio of the target.For example, an oxide target containing In₂O₃, Ga₂O₃, and ZnO, in whichIn₂O₃ Ga₂O₃:ZnO=1:1:1 (mole ratio), can be used. Alternatively, forexample, an oxide target containing In₂O₃, Ga₂O₃, and ZnO, in whichIn₂O₃:Ga₂O₃:ZnO=1:1:2 (mole ratio), can be used.

In the case where an In—Zn—O-based material is used for the oxidesemiconductor, the atomic composition ratio in the target used isIn:Zn=50:1 to 1:2 (In₂O₃:ZnO=25:1 to 1:4 (mole ratio)), preferably,In:Zn=20:1 to 1:1 (In₂O₃:ZnO=10:1 to 1:2 (mole ratio)), and furtherpreferably, In:Zn=15:1 to 1.5:1 (In₂O₃:ZnO=15:2 to 3:4 (mole ratio)).For example, in a target used for formation of an In—Zn—O-based oxidesemiconductor, the atomic ratio of In to Zn and O is X:Y:Z, whereZ>1.5X+Y.

For example, in the case where an In—Sn—Zn—O-based material is used forthe oxide semiconductor, the oxide semiconductor layer can be formedusing a target. A variety of composition ratios can be used as thecomposition ratio of the target. For example, an oxide target containingIn, Sn, and Zn, in which the atomic ratio of In to Sn and Zn is 1:2:2(═In:Sn:Zn), can be used. Alternatively, for example, an oxide targetcontaining In, Sn, and Zn, in which the atomic ratio of In to Sn and Znis 2:1:3 (═In:Sn:Zn), can be used. Alternatively, for example, an oxidetarget containing In, Sn, and Zn, in which the atomic ratio of In to Snand Zn is 1:1:1 (═In:Sn:Zn), can be used. Alternatively, for example, anoxide target containing In, Sn, and Zn, in which the atomic ratio of Into Sn and Zn is 20:45:35 (═In:Sn:Zn), can be used.

Note that the relative density of the target is higher than or equal to90% and lower than or equal to 100%, preferably higher than or equal to95% and lower than or equal to 99.9%. Use of a target having highrelative density makes the formed oxide semiconductor layer dense.

Then, a resist mask is formed through a photolithography process. Theoxide semiconductor layer is selectively etched using the resist mask tobe processed into an island shape (see FIG. 8B).

Formation of Electrode Functioning as Source Electrode or DrainElectrode

Then, the electrodes 751 and 752 functioning as a source and drainelectrodes are formed.

A layer which is to be a source and drain electrodes and contains anelectrically conductive material is formed by a sputtering method or thelike.

Then, a resist mask is formed through a photolithography process. Thelayer containing an electrically conductive material is selectivelyetched using the resist mask, so that the electrodes 751 and 752 areformed (see FIG. 8C). Note that a wiring and the like (not illustrated)made of the layer containing an electrically conductive material areformed in the same step.

Formation of Insulating Layer for Protecting Transistor

Next, the insulating layer 705 for protecting the transistor is formed.

The insulating layer for protecting the transistor is formed by a plasmaCVD method, a sputtering method, or the like.

Through the above steps, the transistor 710 which includes an oxidesemiconductor material in a region where a channel is formed can beobtained.

Note that the resist mask used in this embodiment is not limited to aresist mask formed through a photolithography process. The resist maskcan be formed by an inkjet method, a printing method, or the like asappropriate instead of a photolithography process. When the resist maskis formed without the use of a photomask, the manufacturing cost of alight-emitting device can be reduced.

This embodiment can be implemented in combination with any of the otherembodiments in this specification as appropriate.

Embodiment 9

In this embodiment, a passive matrix light-emitting device of oneembodiment of the present invention is described. Specifically, thepassive matrix light-emitting device has a structure in which aplurality of light-emitting elements and a viscous material layer over afirst substrate are sealed in a space between the first substrate and asecond substrate which face each other, with a sealing materialsurrounding the plurality of light-emitting elements. The viscousmaterial layer is surrounded by a frame, in contact with thelight-emitting element and provided between the first and secondsubstrates, and includes a non-solid material having viscosity and adrying agent that reacts with an impurity (typically water and/oroxygen) or adsorbs an impurity.

Passive Matrix Light-Emitting Device

A structure in which a light-emitting element and a viscous materiallayer are sealed with a sealing material surrounding the light-emittingelement is applied to a passive matrix light-emitting device isillustrated in FIGS. 9A and 9B. Note that FIG. 9A is a top view of thelight-emitting device. FIG. 9B is a perspective view illustratingdetails of a pixel portion provided over the first substrate of thelight-emitting device illustrated in FIG. 9A. FIG. 9C is across-sectional view along the line X-Y of FIG. 9A.

The passive matrix light-emitting device 2500 has a structure in whichthe pixel portion 2402, the viscous material layer 2507, and the frame2406 surrounding the pixel portion 2402 are sealed in a space betweenthe first substrate 2501 and the second substrate 2520, with the sealingmaterial 2405 (see FIG. 9A and FIG. 9B).

The pixel portion 2402 includes light-emitting elements provided in amatrix, in each of which a layer 2504 including an organic compoundhaving a light-emitting property is provided between a first electrode2502 provided over the first substrate 2501 and a second electrode 2503which crosses the first electrode 2502. As a structure of thelight-emitting element, for example, the structure of the light-emittingelement exemplified in Embodiment 6 can be employed. Note that an edgeportion of the first electrode 2502 is covered with an insulating layer2505 and a partition layer 2506 is provided over the insulating layer2505.

Sidewalls of the partition layer 2506 slope so that the distance betweenone sidewall and the other sidewall gradually decreases toward thesurface of the substrate. In other words, a cross section taken alongthe direction of the short side of the partition layer 2506 istrapezoidal, and the base (side parallel to the plane of the insulatinglayer 2505 and in contact with the insulating layer 2505) is shorterthan the upper side (side parallel to the plane of the insulating layer2505 and not in contact with the insulating layer 2505). The secondelectrode 2503 is divided to form a stripe pattern by the partitionlayer 2506 provided as described above, so that a malfunction of thelight-emitting device due to crosstalk or the like can be prevented.

Further, the light-emitting elements included in the light-emittingdevice exemplified in this embodiment exhibit white light. The secondsubstrate 2520 is provided with a color filter 2140R which transmits redlight, a color filter 2140G which transmits green light, and a colorfilter 2140B which transmits blue light. The first substrate 2501 andthe second substrate 2520 are bonded with the sealing material 2405 sothat the color filters and the respective light-emitting elements canoverlap.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

Embodiment 10

In this embodiment, electronic devices of one embodiment of the presentinvention are described. Specifically, the electronic devices have astructure in which a light-emitting element formed over a firstsubstrate and a viscous material layer are sealed in a space between thefirst substrate and a second substrate which face each other, with asealing material surrounding the light-emitting element. The electronicdevices each incorporating a light-emitting module including alight-emitting module, in which the viscous material layer is surroundedby a frame, in contact with the light-emitting element and providedbetween the first and second substrates, and includes a non-solidmaterial having viscosity and a drying agent that can react with animpurity (typically water and/or oxygen) or adsorb an impurity, aredescribed using FIGS. 10A to 10F.

Examples of the electronic devices to which the light-emitting device isapplied are television sets (also referred to as televisions ortelevision receivers), monitors of computers or the like, cameras suchas digital cameras or digital video cameras, digital photo frames,mobile phone sets (also referred to as mobile phones or mobile phonedevices), portable game machines, portable information terminals, audioplayback devices, large-sized game machines such as pachinko machines,and the like. Specific examples of these electronic devices areillustrated in FIGS. 10A to 10E.

FIG. 10A illustrates an example of a television set. In a television set7100, a display portion 7103 is incorporated in a housing 7101. Thedisplay portion 7103 can display images and can use the light-emittingdevice. In addition, here, the housing 7101 is supported by a stand7105.

The television set 7100 can be operated with an operation switch of thehousing 7101 or a separate remote controller 7110. With operation keys7109 of the remote controller 7110, channels and volume can be adjustedand thus images displayed on the display portion 7103 can be controlled.Furthermore, the remote controller 7110 may be provided with a displayportion 7107 for displaying data output from the remote controller 7110.

Note that the television set 7100 is provided with a receiver, a modem,and the like. With the receiver, general television broadcasts can bereceived. Moreover, when the display device is connected to acommunication network with or without wires via the modem, one-way (froma sender to a receiver) or two-way (between a sender and a receiver orbetween receivers) data communication can be performed.

FIG. 10B illustrates a computer, which includes a main body 7201, ahousing 7202, a display portion 7203, a keyboard 7204, an externalconnection port 7205, a pointing device 7206, and the like. Thiscomputer is manufactured by using a light-emitting device for thedisplay portion 7203.

FIG. 10C illustrates a portable game machine, which includes twohousings, i.e., a housing 7301 and a housing 7302, connected to eachother via a joint portion 7303 so that the portable game machine can beopened or closed. A display portion 7304 is incorporated in the housing7301 and a display portion 7305 is incorporated in the housing 7302. Inaddition, the portable game machine illustrated in FIG. 10C includes aspeaker portion 7306, a recording medium insertion portion 7307, an LEDlamp 7308, an input means (an operation key 7309, a connection terminal7310, a sensor 7311 (a sensor having a function of measuring force,displacement, position, speed, acceleration, angular velocity,rotational frequency, distance, light, liquid, magnetism, temperature,chemical substance, sound, time, hardness, electric field, current,voltage, electric power, radiation, flow rate, humidity, tilt angle,vibration, smell, or infrared rays), or a microphone 7312), and thelike. It is needless to say that the structure of the portable gamemachine is not limited to the above as long as the light-emitting deviceis used for at least either the display portion 7304 or the displayportion 7305, or both of them. The portable game machine may be providedwith other accessories as appropriate. The portable game machine in FIG.10C has a function of reading a program or data stored in a recordingmedium to display it on the display portion, and a function of sharingdata with another portable game machine by wireless communication. Theportable game machine in FIG. 10C can have various functions withoutbeing limited to this example.

FIG. 10D illustrates an example of a mobile phone set. The mobile phoneset 7400 is provided with a display portion 7402 incorporated in ahousing 7401, an operation button 7403, an external connection port7404, a speaker 7405, a microphone 7406, and the like. Note that themobile phone set 7400 is manufactured using a light-emitting device forthe display portion 7402.

When the display portion 7402 of the mobile phone set 7400 illustratedin FIG. 10D is touched with a finger or the like, data can be input tothe mobile phone set 7400. Further, operations such as making a call andcomposing an e-mail can be performed by touching the display portion7402 with a finger or the like.

There are mainly three screen modes for the display portion 7402. Thefirst mode is a display mode mainly for displaying images. The secondmode is an input mode mainly for inputting data such as a character. Thethird mode is a display-and-input mode in which two modes of the displaymode and the input mode are combined.

For example, in the case of making a call or composing an e-mail, acharacter input mode mainly for inputting a character is selected forthe display portion 7402 so that a character displayed on a screen canbe input. In that case, it is preferable to display a keyboard or numberbuttons on almost all the area of the screen of the display portion7402.

When a detection device including a sensor for detecting inclination,such as a gyroscope or an acceleration sensor, is provided inside themobile phone set 7400, display on the screen of the display portion 7402can be automatically changed by determining the orientation of themobile phone set 7400 (whether the mobile phone set is placedhorizontally or vertically for a landscape mode or a portrait mode).

The screen modes are switched by touching the display portion 7402 oroperating the operation button 7403 of the housing 7401. Alternatively,the screen modes can be switched depending on kinds of images displayedon the display portion 7402. For example, when a signal of an imagedisplayed on the display portion is a signal of moving image data, thescreen mode is switched to the display mode. When the signal is a signalof text data, the screen mode is switched to the input mode.

Moreover, in the input mode, when input by touching the display portion7402 is not performed within a specified period while a signal detectedby an optical sensor in the display portion 7402 is detected, the screenmode may be controlled to be switched from the input mode to the displaymode.

The display portion 7402 may function as an image sensor. For example,an image of a palm print, a fingerprint, or the like is taken bytouching the display portion 7402 with the palm or the finger, wherebypersonal authentication can be performed. Further, by providing abacklight or a sensing light source which emits a near-infrared light inthe display portion, an image of a finger vein, a palm vein, or the likecan also be taken.

FIG. 10E illustrates an example of a folding computer. The foldingcomputer 7450 includes a housing 7451L and a housing 7451R connected byhinges 7454. The folding computer 7450 further includes an operationbutton 7453, a left speaker 7455L, and a right speaker 7455R. Inaddition, a side surface of the folding computer 7450 is provided withan external connection port 7456, which is not illustrated. Note thatwhen the folding computer is folded on the hinges 7454 so that thedisplay portion 7452L provided in the housing 7451L and the displayportion 7452R provided in the housing 7451R can face each other, thedisplay, portions can be protected by the housings.

Each of the display portions 7452L and 7452R is a component which candisplay images and to which information can be input by touch with afinger or the like. For example, the icon for the installed program isselected by touch with a finger, so that the program can be started.Further, changing the distance between fingers touching two positions ofthe displayed image enables zooming in or out on the image. Drag of afinger touching one position of the displayed image enables drag anddrop of the image. Selection of the displayed character or symbol on thedisplayed image of a keyboard by touch with a finger enables informationinput.

Further, the computer 7450 can also include a gyroscope, an accelerationsensor, a global positioning system (GPS) receiver, fingerprint sensor,or a video camera. For example, a detection device including a sensorwhich detects inclination, such as a gyroscope or an accelerationsensor, is provided to determine the orientation of the computer 7450(whether the computer is placed horizontally or vertically for alandscape mode or a portrait mode) so that the orientation of thedisplay screen can be automatically changed.

Furthermore, the computer 7450 can be connected to a network. Thecomputer 7450 not only can display information on the Internet but alsocan be used as a terminal which controls another electronic deviceconnected to the network from a distant place.

FIG. 10F illustrates an example of a lighting device. In a lightingdevice 7500, light-emitting devices 7503 a to 7503 d of one embodimentof the present invention are incorporated in a housing 7501 as lightsources. The lighting device 7500 can be attached to a ceiling, a wall,or the like.

The light-emitting device of one embodiment of the present inventionincludes a light-emitting module in a thin film form. Thus, when thelight-emitting device is attached to a base with a curved surface, alight-emitting device with a curved surface can be obtained. Inaddition, when the light-emitting device is located in a housing with acurved surface, an electronic device or a lighting device with a curvedsurface can be obtained.

Note that this embodiment can be combined with any of the otherembodiments in this specification as appropriate.

This application is based on Japanese Patent Application serial no.2011-184869 filed with the Japan Patent Office on Aug. 26, 2011, theentire contents of which are hereby incorporated by reference.

What is claimed is:
 1. (canceled)
 2. A light-emitting module comprising:a pixel portion, a source driver circuit and a gate driver circuit overa substrate, the pixel portion including a transistor, a light-emittingelement and a partition over the transistor; and a first frame and asecond frame over the substrate, wherein the source driver circuit andthe gate driver circuit are surrounded by the first frame and the secondframe, and the pixel portion is surrounded by the second frame, whereinthe second frame includes an opening.
 3. The light-emitting moduleaccording to claim 2, further comprising a sealing material in contactwith an entire outer surface of the first frame.
 4. The light-emittingmodule according to claim 3, wherein a width of the sealing material islarger than a width of the first frame.
 5. The light-emitting moduleaccording to claim 2, wherein the second frame shares one side of thefirst frame.
 6. The light-emitting module according to claim 2, furthercomprising a viscous material layer including a drying agent over thepartition and the light-emitting element.
 7. The light-emitting moduleaccording to claim 2, wherein the light-emitting module is incorporatedinto a display device of a television set, a computer, a portable gamemachine, or a mobile phone set.
 8. A light-emitting module comprising: apixel portion, a source driver circuit and a gate driver circuit over asubstrate, the pixel portion including a transistor, a light-emittingelement and a partition over the transistor; and a first frame over thesubstrate and a second frame over the partition, wherein the sourcedriver circuit and the gate driver circuit are surrounded by the firstframe and the second frame, and the pixel portion is surrounded by thesecond frame.
 9. The light-emitting module according to claim 8, furthercomprising a sealing material in contact with an entire outer surface ofthe first frame.
 10. The light-emitting module according to claim 9,wherein a width of the sealing material is larger than a width of thefirst frame.
 11. The light-emitting module according to claim 8, whereinthe second frame shares one side of the first frame.
 12. Thelight-emitting module according to claim 8, further comprising a viscousmaterial layer including a drying agent over the partition and thelight-emitting element.
 13. The light-emitting module according to claim8, wherein the light-emitting module is incorporated into a displaydevice of a television set, a computer, a portable game machine, or amobile phone set.
 14. A light-emitting module comprising: a pixelportion, a source driver circuit and a gate driver circuit over asubstrate, the pixel portion including a transistor, a light-emittingelement and a partition over the transistor; and a first frame over thesubstrate and a second frame over the partition, wherein the sourcedriver circuit and the gate driver circuit are surrounded by the firstframe and the second frame, and the pixel portion is surrounded by thesecond frame, wherein the second frame includes an opening.
 15. Thelight-emitting module according to claim 14, further comprising asealing material in contact with an entire outer surface of the firstframe.
 16. The light-emitting module according to claim 15, wherein awidth of the sealing material is larger than a width of the first frame.17. The light-emitting module according to claim 14, wherein the secondframe shares one side of the first frame.
 18. The light-emitting moduleaccording to claim 14, further comprising a viscous material layerincluding a drying agent over the partition and the light-emittingelement.
 19. The light-emitting module according to claim 14, whereinthe light-emitting module is incorporated into a display device of atelevision set, a computer, a portable game machine, or a mobile phoneset.